Chromium rotary targets are high-density chromium sputtering materials designed for stable thin film deposition in large-area magnetron sputtering systems. Due to their excellent hardness, corrosion resistance, and plasma stability, chromium rotary targets are widely used in architectural glass coating, decorative PVD, optical films, and industrial vacuum coating applications.
Compared with conventional planar targets, chromium rotary targets provide higher target utilization, longer sputtering cycles, and more uniform erosion behavior, making them suitable for continuous inline coating production.
We supply high-purity Cr rotary targets with customizable dimensions, bonding structures, and oxygen-controlled manufacturing processes to meet various industrial coating requirements.
High Purity Chromium Material
Low Oxygen Content Available
High Density and Uniform Microstructure
Stable Plasma Performance
Excellent Rotary Sputtering Efficiency
Optional Bonded or Monolithic Structure
Precise Dimensions and Tolerance Control
Customizable Lengths and Tube Sizes
Fast Delivery and Technical Support
Architectural Glass Coating:Cr rotary targets are widely used in Low-E glass coating systems as adhesion layers and functional protective coatings. Their stable sputtering behavior helps improve coating uniformity and production efficiency.
Decorative PVD Coating:
Used for decorative coatings on:
Hardware
Automotive trim
Consumer products
Wear-resistant surfaces
Chromium coatings provide metallic appearance, hardness, and corrosion resistance.
Optical Thin Films:
Cr rotary targets are suitable for optical film deposition requiring:
Stable plasma discharge
Uniform coating thickness
Low particle generation
Roll-to-Roll Vacuum Coating
High-density chromium tube targets are commonly used in continuous web coating systems due to their long campaign performance and high target utilization.
Q1: What purity levels are available for chromium targets?
A1:We can supply chromium rotary targets with purity up to 99.5% and 99.95% depending on application requirements.
Q2: Can low oxygen chromium rotary targets be supplied?
A2:Yes. Low oxygen processing is available for applications requiring improved plasma stability and reduced arcing during high-power sputtering.
Q3: What bonding options are available?
A3:We offer bonded chromium rotary targets with various backing tube solutions depending on cathode system requirements.
Q4: What sizes can you manufacture?
A4:Custom dimensions, lengths, outer diameters, and wall thicknesses are available according to customer drawings or sputtering system specifications.
Each batch can be supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Dimensional Inspection Report
Density and Purity Test Reports
Third-party testing reports upon request
We specialize in high-purity sputtering materials and industrial rotary target manufacturing. Our chromium rotary targets are produced with strict quality control to ensure stable sputtering performance, reliable bonding quality, and consistent material properties.With flexible customization capabilities, fast response, and technical support, we help customers improve coating stability and production efficiency in demanding vacuum deposition applications.
Molecular Formula: Cr
Molecular Weight: 52.00 g/mol
Appearance: Silvery-white rotary target material
Density: 7.19 g/cm³
Melting Point: 1907 °C
Boiling Point: 2671 °C
Crystal Structure: Body-centered cubic (BCC)
Inner packaging: Vacuum-sealed bags or bottles to prevent contamination and moisture.
Outer packaging: Appropriate cartons or drums selected based on size and weight.
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