Zinc Fluoride sputtering targets possess high purity and excellent sputtering performance, widely used in thin film deposition, optical coating, and electronic component production to ensure efficient and stable operation.
Our ZnF2 sputtering targets are manufactured using precision processes, ensuring high purity and good stability, suitable for various thin film technology requirements. Please contact us for more product information and technical support.
High purity, improving film quality
Strong stability, extending service life
Excellent sputtering performance, improving efficiency
Compliant with industry standards, widely applicable
Uniform particles, excellent sputtering effect
Customized services to meet specific needs
Strict quality control ensures stable supply
High performance, adaptable to complex working environments
Optical Coating: Used in the optics field to coat optical glass and lenses, improving light transmittance and anti-reflection properties.
Electronic Components: Used in the electronics industry for the manufacture of semiconductor devices, optimizing thin film performance.
Thin Film Deposition: Used in various thin film technologies, ZnF2 targets play a stabilizing role in high-efficiency thin film deposition processes.
Laser Devices: Suitable for laser device manufacturing, improving equipment performance and stability.
Q1: What is the purity of our ZnF2 sputtering targets?
A1: Our targets have a purity of 99.99%, meeting the requirements of most demanding thin film deposition applications.
Q2: Which thin film deposition techniques can our ZnF2 sputtering targets be used for?
A2: Suitable for various thin film deposition techniques such as magnetron sputtering and reactive sputtering, widely used in optics, electronics, and materials science.
Q3: What is the sputtering efficiency of our ZnF2 sputtering targets?
A3: Excellent sputtering efficiency, providing high-quality, uniform thin film deposition and ensuring process stability.
Q4: What is the lifespan of our ZnF2 sputtering targets?
A4: Under normal operating conditions, they have a long lifespan. Strict quality control ensures stable performance.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports available upon request
We focus on the R&D and production of high-performance sputtering targets, providing high-quality ZnF2 sputtering targets to meet diverse customer needs in thin film deposition processes. We offer professional technical support to ensure stable product quality and performance.
Molecular Formula: ZnF₂
Molecular Weight: 81.38 g/mol
Appearance: White, dense ceramic target with a smooth and uniform surface
Density: 4.82 g/cm³
Melting Point: 872 °C
Boiling Point: 1,500 °C (decomposes)
Crystal Structure: Tetragonal (Rutile-type structure)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
