Strontium Aluminum Oxide sputtering targets are structurally stable, uniformly deposited multi-element oxide targets suitable for the fabrication of functional thin films, optical coatings, and electronic materials.
We offer Strontium Aluminum Oxide sputtering targets in various purities, densities, sizes, and structural types. We can also assist customers in confirming film formation requirements, selecting appropriate target types, and provide advice on shipping, packaging, cleaning, and application debugging. Please contact us anytime for a quote.
High-density pressing molding
Good film uniformity
Stable ion density
Low impurity content
Suitable for various sputtering systems
Customizable to equipment size
Supports target bonding
High mechanical strength, less prone to cracking
Stable film adhesion
Used in optical coating preparation to improve film stability and light transmittance.
Applied to functional ceramic thin films for structural reinforcement and material modification.
Used as a target material source for composite oxide thin films in electronic component manufacturing.
Suitable for research applications in preparing multi-component oxide thin films with special properties.
Q1: Will the Strontium Aluminum Oxide sputtering target exhibit uneven edge ablation?
A1: The target is manufactured using a high-density process, which reduces edge wear differences. However, process parameters still need to be adjusted according to the equipment power and magnetic field distribution to achieve a more uniform sputtering state.
Q2: Does the target require shockproof treatment during transportation?
A2: Yes, we use a double-layer protective structure of foam cushioning and vacuum packaging to ensure that the target does not crack or chip during long-distance transportation.
Q3: What factors mainly affect the lifespan of the target?
A3: Power settings, vacuum environment, cooling effect, and target thickness all affect the service life. A more suitable target size can be selected according to the process design.
Q4: Can this target be used for pulsed DC or RF sputtering?
A4: Yes, this material is suitable for various sputtering methods. We can provide corresponding target structures and installation dimensions depending on the equipment type.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports available upon request
We have stable process control capabilities in the production of multi-element oxide targets, ensuring a high degree of consistency in the density, structural uniformity, and thin film deposition performance of our Strontium Aluminum Oxide targets. Combined with flexible customization support, rigorous quality testing, professional packaging methods, and stable international logistics, we can provide reliable and consistent target supply solutions for research and industrial clients, helping them achieve higher quality thin film results.
Chemical Formula: SrAl₂O₄
Molecular Weight: 183.95 g/mol
Appearance: White to light green ceramic sputtering target
Density: ~3.56 g/cm³
Melting Point: ~1,930 °C (approx.)
Crystal Structure: Monoclinic (β-phase) or Hexagonal (α-phase)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
