Niobium nitride sputtering targets are ceramic targets with high hardness, excellent conductivity, and superior high-temperature resistance, specifically designed for preparing high-adhesion, wear-resistant, and functional films. They are primarily used for preparing hard coatings, superconducting thin films, electrically functional films, and high-temperature protective layers.
We can produce high-density NbN targets with a purity of up to 99.5%, supporting various geometries such as circular, rectangular, and rotating targets. Targets can be prepared using hot pressing, hot isostatic pressing (HIP), or vacuum sintering processes, and we offer professional backplate bonding services to ensure sputtering stability and heat dissipation performance. Contact us for technical support.
High-density target structure
Excellent wear resistance and high-temperature resistance
Selectable purity, strict impurity control
Custom sizes and shapes available
Excellent film uniformity
Stable sputtering rate
Backplate bonding available
Hard Coating Preparation: Deposition of high-wear-resistant protective films for cutting tools, molds, and mechanical parts. Superconducting Thin Film Manufacturing: Suitable for preparing NbN films with low-temperature superconducting properties.
Electronic and Microelectronic Components: Used for fabricating electrically functional thin films such as barrier layers and contact layers.
High-Temperature Environmental Protection Layers: Used for heat-resistant and corrosion-resistant coating deposition in high-temperature equipment and components.
Q1: What is the standard packaging method for NbN sputtering targets?
A1: Each target is vacuum-sealed and equipped with a shockproof outer box to ensure that the surface remains clean and crack-free during transportation.
Q2: What processing methods do you offer?
A2: We support HIP densification, hot pressing sintering, precision machining, grinding and polishing, and diffusion bonding services between the target and the backplane.
Q3: How should this target be stored?
A3: It is recommended to store it in a dry environment, avoiding moisture and corrosive gases, to ensure the surface condition of the target and sputtering stability.
Q4: What purity level can the NbN target achieve?
A4: 99.5% purity grade available, with accompanying component analysis reports.
Reports
Component Analysis Report (ICP, XRF)
XRD Phase Structure Analysis
Surface Roughness Test
Density and Packing Density Test
Dimensional and Tolerance Inspection Certificate
RoHS, REACH, and other safety compliance documents
Certificate of Authorization (COA)
Why Choose Us?
Extensive experience specializing in ceramic and refractory material target preparation
Multiple process routes to meet research and mass production needs
Strict purity and structure control ensures stable film performance
Support for global supply chain and rapid delivery
Professional technical team can provide film process parameter references
Customizable target formulations, shapes, and backplane structures
Stable reputation, trusted by customers in the optoelectronics, semiconductor, and coating industries
Chemical Formula: NbN
Molecular Weight: 106.91 g/mol
Appearance: Black, dense target material
Density: ≈ 8.47 g/cm³
Melting Point: Approximately 2580 ℃
Crystal Structure: Face-centered cubic structure
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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