| Product ID | Formula | Purity | Dimension | Inquiry |
|---|---|---|---|---|
| 282300ST001 | NiV (95/5at%) | 99.95% | Ø 76.2 mm x 3.175 mm | Inquire |
| 282300ST002 | NiV (93:7 wt%) | 99.95% | Ø 76.2 mm x 6.35 mm | Inquire |
| 282300ST003 | NiV (93:7 wt%) | 99.95% | Ø 101.6 mm x 6.35 mm | Inquire |
| 282300ST004 | NiV (93:7 wt%) | 99.95% | Ø 203.2 mm x 3.175 mm | Inquire |
| 282300ST005 | NiV (95/5at%) | 99.95% | Ø 203.2 mm x 6.35 mm | Inquire |
| 282300ST006 | NiV (93:7 wt%) | 99.95% | Ø 334 mm x 7 mm | Inquire |
| 282300ST007 | NiV (95/5at%) | 99.95% | 488 mm x 87.5 mm x 5mm | Inquire |
Nickel Vanadium Alloy sputtering targets are nickel-vanadium alloy targets primarily used to prepare alloy thin films with good stability and functional controllability.
We can provide NiV sputtering targets with stable composition ratios and high density, and support customized specifications and technical collaboration. Please contact us for solutions.
High target density
Uniform composition distribution
Stable sputtering process
Good film consistency
Custom processing supported
Custom bonding and backplane support supported
Functional Alloy Thin Film Deposition: NiV sputtering targets are suitable for magnetron sputtering processes, enabling the deposition of nickel-vanadium alloy thin films with controllable composition for functional materials research.
Microelectronics and Device Materials Research: In microelectronics-related research, this target can be used to explore the performance of alloy thin films in terms of conductivity and structural stability.
Surface Engineering and Modified Coatings: Nickel-vanadium thin films prepared by sputtering can be used for surface modification research to improve the overall performance of materials under specific environments.
Research and Laboratory Development: Suitable for universities and research institutions for fundamental experiments and process parameter optimization of novel alloy thin film systems.
Q1: Which sputtering process is NiV sputtering target suitable for?
A1: Primarily used for DC or magnetron sputtering processes; the specific method can be adjusted according to equipment conditions.
Q2: Can the target composition ratio be adjusted?
A2: Different nickel-vanadium ratios can be provided upon request for comparative experiments or specific thin film performance studies.
Q3: Is the NiV target stable during sputtering?
A3: Under reasonable process parameters, the target is consumed uniformly, which is beneficial for obtaining consistent thin films.
Q4: Do you support small-size or research-grade targets?
A4: We support research-grade, small-size, and non-standard customized targets, suitable for laboratory use.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports available upon request
We have mature processing and quality control experience in the field of alloy sputtering targets, and we pay attention to the stability and application adaptability of the targets, which can provide continuous support for the long-term use and experimental reliability of NiV sputtering targets.
Molecular formula: NiV
Appearance: Metallic luster, usually silver-gray or black
Crystal structure: Cubic crystal structure
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
