Magnesium metal sputtering targets are high-purity metal targets used in vacuum deposition processes, exhibiting excellent sputtering stability and film uniformity. They are primarily used in functional thin film preparation, surface modification, and related materials research.
We offer magnesium metal sputtering targets in various sizes, purities, and structures, supporting customized processing and stable supply. Please contact us directly for parameters and quotations.
High-purity magnesium metal targets
Dense microstructure, stable sputtering
Uniform film formation, good repeatability
Controllable impurity content
Compatible with various sputtering equipment
Custom sizes and shapes supported
Functional Thin Film Deposition: Can be used to prepare magnesium metal or related functional layer thin films, meeting requirements for film uniformity and purity.
Surface Modification and Coating Research: In materials surface engineering, sputtering with this target can achieve surface property control and structural optimization.
Vacuum Coating Process Development: Commonly used for parameter testing and process verification in magnetron sputtering and related vacuum processes.
Research and Laboratory Applications: Widely used in universities and research institutions for the study of novel thin film materials and reaction mechanisms.
Q1: Which sputtering method is suitable for magnesium metal sputtering targets?
A1: Typically used in magnetron sputtering and related vacuum deposition processes. The specific method can be matched according to the equipment.
Q2: Are magnesium targets easily oxidized during sputtering?
A2: Magnesium has a certain degree of reactivity. It is usually used under controlled atmosphere and vacuum conditions to reduce the impact of oxidation.
Q3: Can magnesium metal sputtering targets be customized in size?
A3: Yes, we can customize them according to the target size and equipment requirements.
Q4: Are magnesium targets suitable for long-term continuous use?
A4: Under reasonable power and process parameters, magnesium targets can maintain stable sputtering performance.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We specialize in material control and processing consistency for sputtering targets, providing tailored solutions based on actual equipment and process requirements to help customers improve film stability and reduce trial-and-error costs.
Molecular Formula: Mg
Molecular Weight: 24.31 g/mol
Appearance: Silvery-white dense target
Density: 1.738 g/cm³
Melting Point: 650 °C
Boiling Point: 1090 °C
Crystal Structure: Hexagonal close-packed (hcp)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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