ULPMAT

Magnesium Boride

Chemical Name:
Magnesium Boride
Formula:
MgB2
Product No.:
120500
CAS No.:
12007-25-9
EINECS No.:
234-501-2
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Inquiry
120500ST001 MgB2 99% Ø 50.8mm x 6.35mm Inquire
Product ID
120500ST001
Formula
MgB2
Purity
99%
Dimension
Ø 50.8mm x 6.35mm

Magnesium Boride Sputtering Target Overview

Magnesium Boride sputtering targets are functional ceramic targets primarily composed of magnesium boride, exhibiting excellent thermal stability and structural reliability. These targets are suitable for thin film deposition in research fields such as functional thin films, high-temperature coatings, and related materials.

We offer magnesium boride sputtering targets in various sizes, thicknesses, and density control, and support custom processing and technical consultation. Please contact us directly for a quote.

Product Highlights

Stable structure of metal borides
High target density, smooth sputtering process
Excellent high-temperature resistance
Smooth surface, good film consistency
Supports multi-specification custom processing
Suitable for research and small-batch production

Applications of Magnesium Boride Sputtering Targets

Functional Thin Film Deposition: Can be used to prepare functional thin films with uniform composition, meeting the requirements of high film quality and stability in applications.
High-Temperature Coating Preparation: Used in high-temperature or protective coatings to improve the structural stability of the film under thermal conditions.
Electronic and Functional Materials Research: Suitable for thin film research of electronic materials and related functional materials, facilitating process parameter adjustment and performance evaluation.
Scientific Research and Process Validation: Supports sputtering process validation in laboratory and pilot-scale stages, facilitating the rapid deployment of new material thin films.

FAQs

Q1: Which type of sputtering equipment is suitable for magnesium boride sputtering targets?
A1: Suitable for RF sputtering and related magnetron sputtering equipment, meeting the needs of scientific research and industrial applications.

Q2: Does target density affect film quality?
A2: High density helps reduce the risk of particle detachment and improves film uniformity and stability.

Q3: Can target sizes be customized according to equipment requirements?
A3: Yes, we support customized processing of round, square, and other special specifications.

Q4: What precautions should be taken when storing and using targets?
A4: It is recommended to store targets in a dry, clean environment in a sealed container. Keep the target surface clean before use.

Report

Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request

Why Choose Us?

We have long focused on the preparation and quality control of metal boride sputtering targets, providing stable and reliable products and rapid technical support to help customers efficiently complete thin film deposition and application verification.

Molecular Formula: MgB2
Molecular Weight: 45.93 g/mol
Appearance: Grayish-black dense target
Density: 2.57–2.60 g/cm³ (degree of densification)
Melting Point: 830 °C (decomposes)
Crystal Structure: Hexagonal crystal system (AlB2 type structure)

Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.

Outer Packaging: Cartons or wooden crates selected based on size and weight.

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