Copper selenide sputtering targets are high-purity functional material targets used for thin film deposition and optoelectronic device fabrication, ensuring film uniformity and stable performance.
We can provide high-purity copper selenide sputtering targets in various specifications and sizes according to customer equipment and process requirements. Contact us for customized solutions.
High purity
High compositional uniformity
Stable film deposition
Low impurity content
Compatible with various sputtering equipment
Reliable conductivity and optical properties
Supports custom circular, square, and irregular shapes and bonding
Optoelectronic Thin Film Fabrication: Used for solar cell and photoconductive thin film deposition, ensuring film uniformity and stable optoelectronic performance.
Semiconductor Device Manufacturing: As a p-type semiconductor material target, it can be used in the research and development of new electronic devices and functional materials, ensuring reliable device performance.
Functional Coatings and Industrial Applications: Used for corrosion-resistant, conductive, or special functional coating deposition, improving the lifespan and performance of industrial materials.
Q1: Is copper selenide sputtering suitable for DC sputtering or RF sputtering?
A1: Copper selenide is a semiconductor material, and RF sputtering is generally recommended to ensure uniform and stable film layers.
Q2: Does the sputtering target require special surface treatment?
A2: The sputtering targets are polished and deoxidized at the factory and can be used directly. Pretreatment can be performed according to process requirements if necessary.
Q3: Is copper selenide sputtering target fragile?
A3: Compared to metal targets, copper selenide sputtering targets are more brittle. Care should be taken to prevent impact damage during handling and installation.
Q4: Can you customize the size and shape of the sputtering target?
A4: Yes, we offer round, square, and irregularly shaped custom sputtering targets to meet the needs of different sputtering equipment and processes.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports available upon request
We focus on the production and supply of high-purity functional material sputtering targets. From raw material selection to batch control, we strictly control the process to ensure that copper selenide targets have stable performance in scientific research, industry and thin film preparation of optoelectronic devices, providing customers with reliable and traceable high-quality materials.
Chemical Formula: Cu₂Se
Molecular Weight: 159.16 g/mol
Appearance: Black to grayish-black dense target material
Density: 6.02 g/cm³
Melting Point: 1,070 °C
Crystal Structure: Cubic
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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