Calcium cobaltate sputtering targets are high-performance thermoelectric oxide ceramic targets with a unique layered crystal structure. They are used in physical vapor deposition (PVD) to prepare functional thin films with excellent thermoelectric properties and high-temperature stability, primarily for applications in micro-thermoelectric conversion devices, high-temperature sensors, and novel electronic components.
For detailed technical parameters of this target or to discuss specific application solutions, our technical team is ready to provide one-on-one support.
High-purity phase-controlled synthesis
Excellent thin film thermoelectric properties
Good high-temperature stability
Customizable shapes and sizes
Micro-thermoelectric Conversion Devices: Utilizing the high thermoelectric power factor of sputtered thin films in the vertical direction, efficient small-scale waste heat recovery and self-powering are achieved for microelectronic systems and IoT sensors.
High-Temperature Thermistors: Due to the material’s excellent high-temperature thermal stability and resistivity, the prepared thin films can be used to develop temperature sensor components operating in extreme environments.
Novel Oxide Electronic Devices: As a key functional layer material, it is used in the research and development of next-generation all-oxide thin-film devices with special magnetic and electrical transport properties, serving cutting-edge basic research and prototype development.
Q1: What are the key thermoelectric performance indicators of thin films prepared by sputtering with calcium cobalt oxide targets?
A1: The key lies in the Seebeck coefficient (thermoelectric potential) and power factor of the thin film. Through strict process control, we ensure that the target can deposit thin films with high Seebeck coefficients and suitable conductivity, thereby obtaining excellent power factors.
Q2: How to ensure that the stoichiometry of the thin film is consistent with that of the target during sputtering?
A2: We ensure highly uniform and dense target composition by optimizing the sintering process, and recommend using appropriate sputtering atmospheres (such as argon-oxygen mixtures) and substrate temperatures to effectively reduce oxygen loss during deposition and maintain the stoichiometry of the thin film.
Q3: Which backplanes are typically bonded to this type of target?
A3: Depending on the customer’s equipment and process requirements, we commonly use copper or molybdenum as the backing material for bonding to ensure good thermal conductivity and electrical contact, meeting stable sputtering requirements at different power levels.
Q4: How are the deposition rate and crystal quality of the thin film controlled?
A4: The deposition rate is mainly affected by sputtering power and working gas pressure. The crystal quality of the thin film (orientation, grain size) needs to be optimized by precisely controlling the substrate temperature, annealing process, and sputtering atmosphere. We can provide customers with basic process parameter guidance.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We specialize in the preparation of advanced oxide ceramic materials and have in-depth research and production experience with complex oxides such as calcium cobaltate. We not only provide high-purity sputtering targets with stable quality and reliable performance, but also strive to be a strong support for our customers in the development of novel functional thin films.
Molecular Formula: Ca₃Co₄O₉
Molecular Weight: 485.71 g/mol
Appearance: Black or dark blue target material
Density: 4.50 g/cm³
Melting Point: 1,550 °C
Crystal Structure: Hexagonal crystal system
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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