Thin Film Deposition Overview
Thin film deposition is the process of creating a thin layer of material on a substrate surface. Among these methods, Physical Vapor Deposition (PVD) is an environmentally friendly vacuum coating technology. Common PVD techniques include sputtering, thermal evaporation, electron beam evaporation, and ion plating. Each coating method has its unique characteristics and advantages, and the optimal choice depends on the specific application and the materials used.

Material Supply
We offer a full range of thin film deposition materials suitable for sputtering and thermal/electron beam evaporation processes.

• Sputtering targets – metals, oxides, nitrides, and composite compounds, available in circular, rectangular, tubular, and customized shapes.
• Evaporation materials – particles, granules, and bulk forms with excellent thermal stability and evaporation properties.
• Custom compositions – tailored to specific application requirements, including doping levels, alloy ratios, and microstructure control.

Application Areas

• Electronics industry: integrated circuits, displays, electronic devices
• Optics industry: optical coatings, optical instruments, solar cells
• Medical devices: biosensors, medical instruments, artificial organs
• Other fields: decorative materials, tool manufacturing, catalysts