Lithium Niobium oxide sputtering targets are high-density, high-uniformity functional material targets used in thin film preparation and scientific research experiments. They are widely used in lithium-ion battery cathode films, optoelectronic devices, and functional coating deposition.
We can provide high-density, high-uniformity LNO sputtering targets; sizes, thicknesses, and shapes can all be customized to customer requirements. Contact us for samples and customized solutions!
High density ensures uniform film deposition
Stable crystal structure ensures reliable deposition results
Customizable size, thickness, and shape
Supports research and industrial thin film preparation
Fine surface processing reduces defects
Rapid response from our technical team
Thin Film Cathode Material Preparation: Used for high-performance lithium-ion battery cathode film deposition, improving cycle stability and electrochemical performance.
Optoelectronic Devices: Suitable for optical devices and microelectronic functional thin film deposition, ensuring crystal integrity.
Functional Coatings: Used for sensor, microelectronic structure, and high-precision coating preparation, ensuring dense and uniform films.
Q1: Which deposition processes are suitable for LNO sputtering targets?
A1: Suitable for magnetron sputtering, electron beam evaporation, and other conventional PVD processes.
Q2: Can the size and thickness of the target be customized?
A2: Yes, various specifications are available according to customer equipment requirements.
Q3: How is the uniformity of the deposited film?
A3: The target’s density and optimized crystal structure ensure high film uniformity and crystal quality.
Q4: Are there any defects on the sputtering target surface?
A4: The target surface undergoes precision polishing and processing, resulting in a low defect rate, suitable for high-precision thin film preparation.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
With years of experience in functional material sputtering target production, we can provide customized, high-quality LNO sputtering targets to ensure the stability and efficiency of thin film deposition in scientific research and industrial applications. Our technical team offers rapid response and professional support to help customers achieve high-precision thin film preparation.
Molecular Formula: LiNbO₃
Molecular Weight: 147.85 g/mol
Appearance: Light-colored, dense solid target material
Density: 4.64 g/cm³
Melting Point: 1253 °C
Crystal Structure: Trigonal
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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