Yttrium Nickel Aluminum Alloy sputtering targets are high-purity yttrium nickel-aluminum alloy targets widely used in the fabrication of functional thin films, magnetic materials, and electronic devices.
We offer Yttrium Nickel Aluminum Alloy in various specifications and purity grades to meet the needs of scientific research and industrial thin film deposition. Contact us for customized solutions.
High purity, low impurity content
Uniform and dense structure, stable sputtering performance
Excellent alloy uniformity
Strong thermal stability
Precise chemical composition control
Customizable sizes and shapes
Free choice of bonding and backing plates
Long-term supply, reliable quality
Functional Thin Film Fabrication: Used for electronic and optical thin film deposition, ensuring film uniformity.
Magnetic Materials: Used in magnetic thin films and magnetic sensors, improving performance stability.
Electronic Devices: Enhances reliability and conductivity in microelectronic device manufacturing.
Scientific Research Materials: Providing high-purity sputtering targets for thin film material research.
Q1: What is the purity range of YNiAl sputtering targets?
A1: Our targets achieve a purity of over 99.9%, ensuring stable performance during the thin film deposition process.
Q2: What shapes and sizes of targets can be customized?
A2: We can provide round targets, square targets, and customer-specified sizes and shapes to adapt to different sputtering equipment.
Q3: Are sputtering targets stable during high-temperature deposition?
A3: The targets are dense and uniform, resistant to high-temperature sintering and deposition processes, and have reliable performance.
Q4: What are the packaging and transportation requirements for the targets?
A4: We use moisture-proof and shock-proof packaging to ensure the targets remain intact and facilitate transportation and storage.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports available upon request
We specialize in the production of high-purity YNiAl sputtering targets, with strict quality control and customized services to ensure stable and reliable target performance, meeting the needs of scientific research and industrial thin film deposition.
Chemical Formula: YNiAl
Molecular Weight: 152.43 g/mol
Appearance: Silver-gray metallic powder
Density: ~6.8 g/cm³
Melting Point: ~1,200 °C (approx.)
Crystal Structure: Hexagonal (MgZn₂-type Laves phase)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
