Niobium zirconium alloy sputtering targets are high-purity niobium-zirconium alloy targets, possessing high-temperature stability, corrosion resistance, and excellent mechanical properties. They are widely used in the deposition of functional thin films, electronic devices, and superconducting films. They are primarily used for the preparation of superconducting films, high-performance electronic thin films, magnetic films, and composite functional films.
We offer various specifications of NbZr targets, including circular, rectangular, and rotating targets, with purity ranging from 99.5% to 99.9%. Custom sizes, thicknesses, and backplane structures are available. Targets are prepared using hot-pressing sintering, vacuum high-temperature sintering, or diffusion bonding processes, ensuring high density, uniform film formation, and long lifespan to meet the needs of research and industrial applications. Contact us for a quote.
High-purity niobium-zirconium alloy sputtering target
Excellent high-temperature resistance and corrosion resistance
High density and good film uniformity
Batch stability, suitable for scientific research and industrial applications
Customizable size, thickness, and backplane available
Long-life target, suitable for large-scale sputtering production
Can be processed into rotating targets and thermal management backplane designs
Superconducting Film Deposition: Used for superconducting thin films in MRI, scientific research superconducting devices, and particle accelerators.
Electronic Functional Thin Films: Preparation of conductive films or composite electronic films.
Magnetic Thin Films: Used in high-performance magnetic devices and sensor films.
Composite Functional Films: Suitable for multilayer composite films or high-performance thin film materials.
Q1: How is the NbZr sputtering target packaged?
A1: The target is vacuum-sealed or protected with inert gas, and supplemented with a shockproof outer box to ensure safe transportation and prevent oxidation.
Q2: What processing or customization options are available for the target?
A2: We offer hot-pressing sintering, CNC precision machining, surface grinding and polishing, and backplate diffusion bonding processes. We also support customized rotating targets.
Q3: How should NbZr sputtering targets be stored?
A3: We recommend storing them in a dry, ventilated, and light-protected environment, avoiding moisture and oxidizing gases to ensure long-term performance stability.
Q4: What purity level can NbZr sputtering targets achieve?
A4: We can provide high-purity targets ranging from 99.5% to 99.9%, along with composition analysis reports and factory COA.
Each batch is provided with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports are available upon request.
Specializing in the production of niobium, zirconium, and rare metal alloy sputtering targets.High purity, high density, and batch stability.
Customizable sizes, thicknesses, and backplate structures.
Suitable for both research and large-scale industrial applications.
A complete testing system ensures traceability of target performance. Our technical team provides sputtering process guidance and application solutions.
Extensive global shipping experience ensures safe and reliable packaging.
Chemical Formula: NbZr
Appearance: Silver-gray dense target material
Crystal Structure: Body-centered cubic structure
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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