ULPMAT

Zirconium Yttrium Alloy

Chemical Name:
Zirconium Yttrium Alloy
Formula:
ZrY
Product No.:
403900
CAS No.:
EINECS No.:
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Inquiry
403900ST001 ZrY 99.9% (Zr + Hf) Ø 101.6 mm x 6.35 mm Inquire
403900ST002 ZrY 99.95% (Zr + Hf) Ø 50.8 mm x 3.175 mm Inquire
403900ST003 ZrY 99.95% (Zr + Hf) Ø 71 mm x 5 mm Inquire
403900ST004 ZrY 99.95% (Zr + Hf) 279 mm x 93 mm x 8mm Inquire
Product ID
403900ST001
Formula
ZrY
Purity
99.9% (Zr + Hf)
Dimension
Ø 101.6 mm x 6.35 mm
Product ID
403900ST002
Formula
ZrY
Purity
99.95% (Zr + Hf)
Dimension
Ø 50.8 mm x 3.175 mm
Product ID
403900ST003
Formula
ZrY
Purity
99.95% (Zr + Hf)
Dimension
Ø 71 mm x 5 mm
Product ID
403900ST004
Formula
ZrY
Purity
99.95% (Zr + Hf)
Dimension
279 mm x 93 mm x 8mm

Zirconium Yttrium Alloy Sputtering Target Overview

Zirconium Yttrium Alloy sputtering targets are high-purity, highly dense metal alloy targets commonly used for the precision fabrication of semiconductor, optoelectronic thin films, and functional coatings.

We offer ZrY sputtering targets in various sizes, shapes, and purity grades. We can customize the Zr:Y ratio, target thickness, diameter, and machining hole positions to meet different coating equipment and process requirements. Whether for scientific research or industrial mass production, we provide stable and controllable target performance and comprehensive technical support. Contact us now!

Product Highlights

High-purity material
Dense target surface for stable sputtering
High compositional uniformity
Customizable Zr:Y ratio
Supports various sizes and shapes
Excellent high-temperature thin film deposition performance
Good film adhesion

Applications of Zirconium Yttrium Alloy Sputtering Target

Semiconductor Industry: Used for the deposition of functional thin films and electronic devices.
Optoelectronic Devices: Used for the deposition of transparent conductive films and optical films.
High-Temperature Coatings: Used for the preparation of protective films in high-temperature operating environments.
Research and Development: Applied to materials science research and the development of novel thin film structures.

FAQs

Q1: How is the purity and composition of the ZrY sputtering target controlled?
A1: The target purity can reach over 99.9%. The Zr:Y ratio can be customized according to customer needs. High compositional uniformity ensures film formation stability.

Q2: What is the packaging method for the target?
A2: Moisture-proof and shock-proof packaging is used. The inner layer is vacuum-sealed or protected with inert gas, and the outer layer is reinforced with wooden crates or cardboard boxes to ensure safe transportation.

Q3: Are processing services available?
A3: Custom processing services such as hole machining, backplate bonding, surface polishing, and dimensional fine-tuning are available, compatible with different sputtering equipment models.

Q4: How should the target be stored?
A4: It is recommended to store it in a dry, light-proof, and dust-free environment, avoiding moisture and contamination. Inert gas packaging can be used to extend the target’s lifespan.

Reports

Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports available upon request

Why Choose Us?

We possess mature ZrY sputtering target manufacturing processes and a rigorous quality control system, enabling us to provide high-purity, dense, and uniformly composed sputtering targets. We also support customized processing and rapid delivery, making us a reliable supplier for research and industrial coating applications.

Molecular Formula: ZrY
Appearance: Dense, silvery-gray target material with a smooth surface
Density: Approximately 6.5 g/cm³
Melting Point: Approximately 1,850 °C
Crystal Structure: Hexagonal close-packed (HCP)

Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.

Outer Packaging: Cartons or wooden crates selected based on size and weight.

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