ULPMAT

Zirconium Silicon Alloy

Chemical Name:
Zirconium Silicon Alloy
Formula:
ZrSi
Product No.:
401401
CAS No.:
EINECS No.:
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Inquiry
401401ST001 ZrSi 99.99% (Zr + Hf) Ø 232.4 mm x 6.35 mm Inquire
Product ID
401401ST001
Formula
ZrSi
Purity
99.99% (Zr + Hf)
Dimension
Ø 232.4 mm x 6.35 mm

Zirconium Silicon Alloy Sputtering Target Overview

Zirconium Silicon Alloy sputtering targets are composite metal targets that combine high-temperature resistance, stable film composition, and excellent mechanical properties. They are commonly used to prepare functional thin films, hard coatings, and microelectronic materials.

We offer ZrSi sputtering targets in various sizes, purities, and structures, including hot isostatic pressing (HIP) targets, hot-pressed targets, cold-pressed sintered targets, and large-size coating targets. Shapes, thicknesses, and composition ratios can be customized according to equipment models. Please contact us if you require custom drawings.

Product Highlights

Uniform composition, dense target surface
Stable sputtering rate
High purity, low inclusions
Supports various custom sizes and bonding
Suitable for long-term continuous sputtering
Excellent film adhesion
Strong process compatibility

Applications of Zirconium Silicon Alloy Sputtering Target

Hard Coating Preparation: Deposition of hard protective films for cutting tools, molds, and wear-resistant parts.
Optical Thin Films: Used for fabricating anti-reflective coatings, optical protective layers, and functional optical structures.
Electronic Thin Film Materials: Used for integrated circuits, micro/nano devices, and semiconductor thin film engineering.
High-Temperature Resistant Films: Used for corrosion-resistant and structurally reinforced film applications in high-temperature environments.

FAQs

Q1: What kind of packaging is typically used for ZrSi sputtering targets?
A1: Targets are typically packaged in shockproof foam boxes with vacuum sealing, and further reinforced with an outer layer depending on the transportation method to ensure the surface is protected from scratches, impacts, and oxidation.

Q2: What processing services are available?
A2: We offer backplate bonding, target welding, surface grinding, dimensional precision machining, and custom hole design to meet the clamping needs of various sputtering equipment brands.

Q3: How should sputtering targets be stored correctly?
A3: Targets should be kept dry and sealed to avoid moisture, fingerprints, and oil contamination. For long-term storage, it is recommended to place them in an inert gas environment or in a sealed bag to maintain target surface quality.

Q4: What are the advantages of the product’s purity and performance?
A4: We offer different purity grades. The targets have high density and good compositional uniformity, suitable for applications requiring high film uniformity and stability.

Report

Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports available upon request

Why Choose Us?

We possess mature target manufacturing processes and professional equipment, enabling us to stably produce high-density, low-defect, and uniformly composed ZrSi sputtering targets. Through rigorous raw material selection, quality inspection, and standardized manufacturing processes, we ensure excellent consistency and sputtering performance in every batch. Furthermore, we support technical consultation, rapid delivery, customized specifications, and long-term supply, providing reliable support for customers in coating process optimization, thin film development, and production stability. We are a trustworthy partner in the materials supply chain.

Molecular formula: ZrSi
Appearance: Dense silver-gray target material with a smooth surface

Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.

Outer Packaging: Cartons or wooden crates selected based on size and weight.

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