Zinc Oxide (Ga doped) Sputtering Target are highly transparent and highly conductive oxide targets, primarily used for preparing transparent conductive thin films, widely applied in displays, photovoltaics, and optoelectronics.
We offer customized target solutions with different doping ratios, sizes, and density specifications. Please contact us for technical parameters and application suggestions.
Stable Ga doping distribution
Excellent thin film conductivity and transmittance
High target density and stable discharge
Suitable for DC and RF sputtering
Good batch consistency
Supports research and mass production needs
Transparent Conductive Co-ops (TCOs): This material can be used to prepare transparent conductive layers with high transmittance and low resistivity, suitable for replacing traditional ITO thin films.
Flat Panel Displays and Touch Panels: Used to form stable electrode films in LCD, OLED, and touch display devices, improving display consistency.
Thin-film solar cells: As a front electrode or functional layer material, it can improve light absorption efficiency and enhance the overall electrical performance of the device.
Optoelectronic and sensor devices: Suitable for optoelectronic thin-film structures such as ultraviolet detectors and gas sensors, in applications requiring high thin-film uniformity.
Q1: What is the difference between Ga-doped zinc oxide and ordinary zinc oxide targets?
A1: Introducing Ga significantly improves the conductivity of the thin film while maintaining good optical transparency.
Q2: Which sputtering process is this type of target suitable for?
A2: Commonly used in DC magnetron sputtering and RF sputtering; the specific process depends on the equipment configuration and film requirements.
Q3: Can the doping ratio be customized?
A3: Yes, various doping schemes are available to meet the resistivity and transmittance requirements of different applications.
Q4: Is the target prone to cracking during use?
A4: By optimizing the sintering process and controlling density, the risk of cracking caused by thermal stress can be effectively reduced.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports available upon request
We specialize in the stable preparation and application matching of functional oxide sputtering materials, emphasizing target structure control, performance consistency, and long-term supply capabilities. We can provide reliable and reproducible material support for research and industrial clients.
Molecular Formula: ZnO-5wt%Ga
Appearance: White, dense ceramic target with a bright and uniform surface
Density: Approximately 5.60 g/cm³
Crystal Structure: Hexagonal Wurtzite (P6₃mc)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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