ULPMAT

Zinc Gallium Alloy

Chemical Name:
Zinc Gallium Alloy
Formula:
ZnGa
Product No.:
303100
CAS No.:
EINECS No.:
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Inquiry
303100ST001 ZnGa 99.99% Ø 101.6 mm x 3.175 mm Inquire
303100ST002 ZnGa 99.99% 150 mm x 75 mm x 3mm Inquire
Product ID
303100ST001
Formula
ZnGa
Purity
99.99%
Dimension
Ø 101.6 mm x 3.175 mm
Product ID
303100ST002
Formula
ZnGa
Purity
99.99%
Dimension
150 mm x 75 mm x 3mm

Zinc Gallium Alloy Sputtering Target Overview

Zinc Gallium Alloy sputtering targets, characterized by high purity and excellent sputtering performance, are widely used in optoelectronic materials, thin film deposition, and electronic device manufacturing.

We offer high-performance ZnGa sputtering targets, rigorously selected and processed to ensure each product meets high standards. Contact us for more product information and technical support.

Product Highlights

High purity ensures film quality
Suitable for various thin film deposition technologies
Excellent sputtering performance and uniformity
Uniform particle size and stable sputtering effect
Long-term stable supply and timely delivery
Customized services to meet special needs
Strict quality control guarantees performance
High cost-effectiveness, suitable for large-scale applications

Applications of Zinc Gallium Alloy Sputtering Targets

Optoelectronic Materials Manufacturing: Used in the manufacture of high-efficiency optoelectronic materials, widely used in the production of solar cells and displays.
Thin Film Deposition: Used in thin film deposition processes to improve film uniformity and performance, suitable for high-precision thin film applications.
Semiconductor Devices: Widely used in semiconductor devices to ensure electrical performance and thermal stability.
Sensor Manufacturing: Can be used to produce various sensors, improving sensitivity and stability to meet the demands of the high-end market.

FAQs

Q1: What is the purity of our ZnGa sputtering targets?
A1: Our targets have a purity of 99.99%, ensuring they meet the high requirements of thin film deposition applications.

Q2: Which thin film deposition technologies are our ZnGa targets suitable for?
A2: Widely used in magnetron sputtering, reactive sputtering, and other thin film deposition technologies, providing stable thin film performance.

Q3: What is the sputtering efficiency of our ZnGa targets?
A3: Our targets have excellent sputtering efficiency, forming uniform thin film layers in a short time, thereby improving production efficiency.

Q4: What is the stability of our ZnGa sputtering targets?
A4: Our targets have excellent stability, maintaining high sputtering efficiency even with long-term use, adapting to various deposition process requirements.

Reports

Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports available upon request

Why Choose Us?

We are committed to providing high-quality ZnGa sputtering targets, employing precision manufacturing processes to meet industry demands, and offering professional technical support to ensure product performance and a stable supply.

Molecular formula: ZnGa
Appearance: Silvery-white metallic target material, dense and uniform, with a bright surface

Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.

Outer Packaging: Cartons or wooden crates selected based on size and weight.

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