ULPMAT

Zinc Aluminum Alloy

Chemical Name:
Zinc Aluminum Alloy
Formula:
ZnAl
Product No.:
301300
CAS No.:
EINECS No.:
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Inquiry
301300ST001 ZnAl 99.99% Ø 25.4 mm x 3.175 mm Inquire
301300ST002 ZnAl 99.999% Ø 25.4 mm x 3.175 mm Inquire
301300ST003 ZnAl 99.999% Ø 50.8 mm x 6.35 mm Inquire
301300ST004 ZnAl 99.999% Ø 76.2 mm x 6.35 mm Inquire
301300ST005 ZnAl 99.999% Ø 101.6 mm x 3.175 mm Inquire
301300ST006 ZnAl 99.999% Ø 152.4 mm x 3.175 mm Inquire
301300ST007 ZnAl 99.999% Ø 152.4 mm x 6.35 mm Inquire
Product ID
301300ST001
Formula
ZnAl
Purity
99.99%
Dimension
Ø 25.4 mm x 3.175 mm
Product ID
301300ST002
Formula
ZnAl
Purity
99.999%
Dimension
Ø 25.4 mm x 3.175 mm
Product ID
301300ST003
Formula
ZnAl
Purity
99.999%
Dimension
Ø 50.8 mm x 6.35 mm
Product ID
301300ST004
Formula
ZnAl
Purity
99.999%
Dimension
Ø 76.2 mm x 6.35 mm
Product ID
301300ST005
Formula
ZnAl
Purity
99.999%
Dimension
Ø 101.6 mm x 3.175 mm
Product ID
301300ST006
Formula
ZnAl
Purity
99.999%
Dimension
Ø 152.4 mm x 3.175 mm
Product ID
301300ST007
Formula
ZnAl
Purity
99.999%
Dimension
Ø 152.4 mm x 6.35 mm

Zinc Aluminum Alloy Sputtering Target Overview

Zinc Aluminum Alloy sputtering targets are high-quality metal targets widely used in thin film coatings, battery materials, and high-performance alloy manufacturing.

We offer high-purity ZnAl sputtering targets suitable for various thin film deposition and electronic device manufacturing needs. Contact us for more customization options.

Product Highlights

High-purity metal
Excellent sputtering performance
Stable chemical properties
Good electrical conductivity
Long service life
High adaptability
Customizable services
Strict quality control

Applications of Zinc Aluminum Alloy Sputtering Targets

Thin Film Deposition: Exhibits excellent performance in various thin film deposition processes and is widely used in the manufacture of optoelectronic devices, sensors, and displays.
Battery Materials: Used in lithium-ion batteries and other battery electrode materials to improve battery performance and stability.
High-Performance Alloys: Plays a crucial role in the production of high-temperature alloys, significantly improving their high-temperature resistance and strength.
Coatings and Protection: Widely used in surface coatings, effectively improving the corrosion resistance and wear resistance of metal surfaces.

FAQs

Q1: What is the purity of our ZnAl sputtering targets?
A1: Our targets have a purity of 99.999%. Custom purity can be provided according to customer requirements.

Q2: What sputtering processes are ZnAl targets suitable for?
A2: Suitable for DC and RF sputtering processes, widely used in the manufacture of semiconductors and optoelectronic devices.

Q3: How should ZnAl sputtering targets be stored?
A3: They should be stored in a dry, well-ventilated environment, avoiding direct contact with humid air to maintain their stability.

Q4: What are the sputtering performance characteristics of ZnAl targets?
A4: They have stable sputtering performance, maintaining a consistent deposition rate under various operating conditions, making them suitable for high-precision thin film manufacturing.

Reports

Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports available upon request

Why Choose Us?

We provide high-quality, high-purity ZnAl sputtering targets. With professional technical support and strict quality control, we are committed to providing the best solutions for your projects, ensuring efficient and reliable application results.

Molecular formula: ZnAl
Appearance: Silvery-white metallic target material, dense and uniform, with a bright surface

Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.

Outer Packaging: Cartons or wooden crates selected based on size and weight.

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