ULPMAT

Zinc Aluminum Alloy

Chemical Name:
Zinc Aluminum Alloy
Formula:
ZnAl
Product No.:
301300
CAS No.:
EINECS No.:
Form:
Rotary Target
HazMat:
Product ID Formula Purity Dimension Inquiry
301300RT001 ZnAl 99.95% OD332 mm x ID147 mm x 2mm Inquire
301300RT002 ZnAl 99.99% OD32 mm x ID23 mm x 150mm Inquire
Product ID
301300RT001
Formula
ZnAl
Purity
99.95%
Dimension
OD332 mm x ID147 mm x 2mm
Product ID
301300RT002
Formula
ZnAl
Purity
99.99%
Dimension
OD32 mm x ID23 mm x 150mm

Zinc Aluminum Alloy Rotary Target Overview

Zinc Aluminum Alloy Rotary Target is high-performance metal targets widely used in thin film deposition, surface treatment, and high-performance alloy manufacturing.

We offer high-quality ZnAl sputtering targets suitable for various sputtering processes, meeting customers’ needs in high-precision thin film production. Please contact us for more information and customization options.

Product Highlights

High Purity Guarantee
Stable Sputtering Performance
High-Efficiency Thin Film Deposition
Excellent Corrosion Resistance
Long Service Life
High Temperature Resistance
Customizable Shapes and Specifications
Precision Quality Control

Applications of Zinc Aluminum Alloy Rotary Target Sputtering Targets

Thin Film Deposition: Exhibiting excellent stability and precision in thin film deposition, it is widely used in the production of electronic and optoelectronic devices.
Surface Coating: In metal surface coating processes, it can effectively improve the wear resistance and corrosion resistance of materials.
Semiconductor Manufacturing: As a high-purity metal target, it is commonly used in thin film deposition processes in semiconductor manufacturing to ensure excellent film quality.
High-Performance Alloys: Widely used in the production of high-performance alloys, it can significantly improve the strength and high-temperature resistance of alloys.

FAQs

Q1: What is the purity of our ZnAl Rotary Target?
A1: Our purity is 99.99%. We can also provide products with different purities according to customer requirements.

Q2: What sputtering processes are ZnAl Rotary Target suitable for?
A2: Suitable for DC sputtering and RF sputtering processes, ideal for high-precision thin film deposition applications.

Q3: How should ZnAl Rotary Target be stored?
A3: They should be stored in a dry environment with a suitable temperature, avoiding moisture and oxidation to maintain their good performance.

Q4: What is the operating temperature range of ZnAl Rotary Target?
A4: They have good high-temperature resistance and can operate stably in high-temperature environments, suitable for most high-temperature sputtering processes.

Reports

Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports available upon request

Why Choose Us?

With our advanced technology and rigorous quality control, we provide high-purity ZnAl sputtering targets, helping customers achieve optimal performance in various high-precision applications and offering customized solutions.

Molecular formula: ZnAl
Appearance: Silvery-white metallic target, dense and uniform, with a glossy surface

Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.

Outer Packaging: Cartons or wooden crates selected based on size and weight.

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