| Product ID | Formula | Purity | Dimension | Inquiry |
|---|---|---|---|---|
| 39260800ST001 | Y3Fe5O12 | 99.99% (REO) | Ø 50.8 mm x 3.175 mm | Inquire |
| 39260800ST002 | Y3Fe5O12 | 99.99% (REO) | Ø 50.8 mm x 6.35 mm | Inquire |
| 39260800ST003 | Y3Fe5O12 | 99.99% (REO) | Ø 76.2 mm x 3.175 mm | Inquire |
| 39260800ST004 | Y3Fe5O12 | 99.99% (REO) | Ø 203.2 mm x 6.35 mm | Inquire |
Yttrium Iron Oxide sputtering targets are high-purity yttrium iron garnet targets widely used in the fabrication of magnetic thin films, microwave devices, and optoelectronic materials.
We offer Y3Fe5O12 sputtering targets in various sizes and purity grades, with customizable shapes and specifications to meet the needs of scientific research and industrial thin film deposition. Please contact us for detailed information.
High purity, low impurities
Uniform and dense structure, stable sputtering
Excellent magnetic properties
Strong thermal stability
Precise chemical composition control
Customizable sizes and shapes
Selectable backplane and bonding methods
Long-term supply, reliable quality
Magnetic Thin Films: Used to manufacture high-performance magnetic thin film devices, improving magnetic response.
Microwave Devices: Used in microwave filters and phase controllers to enhance signal stability.
Optoelectronic Devices: Used for material deposition in optical isolators, lasers, and other devices.
Electronic Ceramics: Used in high-frequency electronic components to improve magnetic properties and stability.
Q1: What is the purity of the Y3Fe5O12 sputtering target?
A1: Our target purity can reach over 99.9%, ensuring stable performance during sputtering deposition.
Q2: Can Y3Fe5O12 sputtering targets be processed into different shapes?
A2: Yes, we support round targets, square targets, and custom-sized targets to meet the needs of different equipment.
Q3: What is the sputtering performance of the target?
A3: The target is dense and uniform with low impurities, exhibiting stable sputtering rates and excellent film quality.
Q4: What are the storage requirements for Y3Fe5O12 targets?
A4: It should be stored in a dry, cool environment, avoiding high temperatures, humidity, or impact to maintain the integrity and performance stability of the target.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports available upon request
We specialize in the R&D and production of high-purity Y3Fe5O12 sputtering targets, with strict quality management, customized services, and guaranteed stable and reliable target performance to meet the needs of scientific research and industrial thin film deposition.
Chemical Formula: Y₃Fe₅O₁₂
Molecular Weight: 737.94 g/mol
Appearance: Dark brown or black ceramic sputtering target
Density: ~5.17 g/cm³
Crystal Structure: Cubic (Garnet structure)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
