| Product ID | Formula | Purity | Dimension | Inquiry |
|---|---|---|---|---|
| 3908400800ST001 | Y2O3-ZrO2 | 99.9% (REO) | Ø 76.2 mm x 3.175 mm | Inquire |
| 3908400800ST002 | Y2O3-ZrO2 | 99.95% (REO) | Ø 50.8 mm x 3.175 mm | Inquire |
| 3908400800ST003 | Y2O3-ZrO2 | 99.95% (REO) | Ø 76.2 mm x 3.175 mm | Inquire |
| 3908400800ST004 | Y2O3-ZrO2 | 99.95% (REO) | Ø 76.2 mm x 6.35 mm | Inquire |
| 3908400800ST005 | Y2O3-ZrO2 | 99.95% (REO) | Ø 101.6 mm x 3.175 mm | Inquire |
| 3908400800ST006 | Y2O3-ZrO2 | 99.95% (REO) | Ø 101.6 mm x 6.35 mm | Inquire |
| 3908400800ST007 | Y2O3-ZrO2 | 99.95% (REO) | Ø 203.2 mm x 6.35 mm | Inquire |
| 3908400800ST008 | Y2O3-ZrO2 | 99.99% (REO) | Ø 50.8 mm x 3.175 mm | Inquire |
| 3908400800ST009 | Y2O3-ZrO2 | 99.99% (REO) | Ø 76.2 mm x 3.175 mm | Inquire |
| 3908400800ST010 | Y2O3-ZrO2 | 99.99% (REO) | Ø 76.2 mm x 6.35 mm | Inquire |
| 3908400800ST011 | Y2O3-ZrO2 | 99.99% (REO) | Ø 101.6 mm x 3.175 mm | Inquire |
| 3908400800ST012 | Y2O3-ZrO2 | 99.99% (REO) | Ø 101.6 mm x 6.35 mm | Inquire |
| 3908400800ST013 | Y2O3-ZrO2 | 99.99% (REO) | Ø 203.2 mm x 6.35 mm | Inquire |
Yttria-Stabilized Zirconia sputtering targets are high-purity rare-earth oxide composite materials widely used in the preparation of optical thin films, ceramic coatings, and functional materials.
We offer Y2O3-ZrO2 sputtering targets in various sizes, proportions, and purity grades, suitable for research and industrial thin film preparation. Whether for ceramic coatings, optical films, or functional material development, we provide customized services and technical support. Contact us for solutions and quotations.
High purity, low impurity content
Uniform density, dense structure
Strong chemical stability
Excellent thermal stability
Easy to vacuum sputter process
High batch consistency
Optional bonding and backing plates
Customizable sizes and proportions
Optical Thin Film Preparation: Used to prepare high-transmittance, high-stability optical films.
Ceramic Coatings: Improves the wear resistance and thermal stability of ceramic surfaces.
Functional Material Deposition: Used for thin film preparation in electronic and optoelectronic devices.
Scientific Research Materials: Providing high-purity, uniform sputtering targets for materials science research.
Q1: Can the Y2O3-ZrO2 ratio of the target be customized?
A1: Yes, we can provide different Y2O3-ZrO2 ratios according to customer needs to meet different thin film performance requirements.
Q2: Which sputtering processes are the targets suitable for?
A2: Suitable for various sputtering processes including DC, RF, and magnetron sputtering.
Q3: How is the density and compactness of the target guaranteed?
A3: The target undergoes high-temperature sintering and strict quality control, resulting in uniform density and a compact structure, ensuring stability during the sputtering process.
Q4: Can the size and shape of the target be customized?
A4: We can provide round, square, and irregularly shaped targets. Sizes are customized according to customer requirements to adapt to different sputtering equipment.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports available upon request
We specialize in the production of high-purity Y2O3-ZrO2 sputtering targets, with strict quality control, providing customized services and technical support to ensure stable target performance and meet the needs of scientific research and industrial thin film preparation.
Chemical Formula: Y₂O₃–ZrO₂
Appearance: White to off-white ceramic sputtering target
Crystal Structure: Cubic (ZrO₂ stabilized by Y₂O₃)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us