ULPMAT

Ytterbium metal

Chemical Name:
Ytterbium metal
Formula:
Yb
Product No.:
7000
CAS No.:
7440-64-4
EINECS No.:
231-173-2
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Inquiry
7000ST001 Yb 99.95% (REO) Ø 50.8 mm x 3.175 mm Inquire
7000ST002 Yb 99.95% (REO) Ø 76.2 mm x 3.175 mm Inquire
7000ST003 Yb 99.95% (REO) Ø 76.2 mm x 6.35 mm Inquire
7000ST004 Yb 99.95% (REO) Ø 101.6 mm x 6.35 mm Inquire
7000ST005 Yb 99.95% (REO) Ø 203.2 mm x 6.35 mm Inquire
Product ID
7000ST001
Formula
Yb
Purity
99.95% (REO)
Dimension
Ø 50.8 mm x 3.175 mm
Product ID
7000ST002
Formula
Yb
Purity
99.95% (REO)
Dimension
Ø 76.2 mm x 3.175 mm
Product ID
7000ST003
Formula
Yb
Purity
99.95% (REO)
Dimension
Ø 76.2 mm x 6.35 mm
Product ID
7000ST004
Formula
Yb
Purity
99.95% (REO)
Dimension
Ø 101.6 mm x 6.35 mm
Product ID
7000ST005
Formula
Yb
Purity
99.95% (REO)
Dimension
Ø 203.2 mm x 6.35 mm

Ytterbium sputtering target Overview

Ytterbium sputtering targets for thin film deposition are high-purity rare earth metal materials developed specifically for the preparation of advanced thin film materials. They are widely used in functional film layers, electronic components, optical coatings, and scientific research and development. With a purity of up to 99.95%, combined with a high-density structure, these Ytterbium sputtering targets with high purity can effectively improve film uniformity, film adhesion, and device stability.

We provide customized Ytterbium sputtering targets in a variety of shapes (round, rectangular, special-shaped) and sizes. Products can also be tailored according to your equipment and process requirements, with optional target bonding services. At the same time, we provide a full set of technical support and after-sales services to ensure that your R&D and mass production processes proceed smoothly.

Product highlights of Ytterbium sputtering target

High density: ensure excellent film formation rate and film consistency
Support customization: shape, size and clamping structure can be customized as needed
Support binding: binding and unbinding services can be provided according to customer requirements
Good compatibility: suitable for DC/RF magnetron sputtering and other systems
Outstanding rare earth characteristics: excellent electronic structure regulation ability and optical responsiveness

Applications of Ytterbium sputtering target

Semiconductor devices: can be used as doping source or functional layer material to optimize device performance
Optoelectronic display: used in OLED/laser/lighting elements as a functional intermediate layer or reflective layer
Solar cells: improve the electrical and optical synergistic performance of the film layer and enhance the energy conversion efficiency of the device
Scientific research and development: widely used in functional oxides, rare earth alloy films and quantum materials research

Report support

We provide Certificate of Analysis (COA), Material Safety Data Sheet (MSDS) and other relevant reports for each batch of goods. In addition, we also support third-party testing to enhance quality assurance.

Molecular Formula: Yb
Molecular Weight: 173.05 g/mol
Appearance: High Purity Silver Gray Metallic Target
Density: 6.90±0.05 g/cm³
Melting Point: 824±2°C
Boiling Point: 1196±5°C
Crystal structure: face-centered cubic
Magnetism: paramagnetic
Bondings: ytterbium metal planar target usually with oxygen-free copper or copper-tungsten alloy backsheet

Signal Word:
Danger
Hazard Statements:
H228 Flammable solid
H260 In contact with water releases flammable gases which may ignite spontaneously

Inner packaging: Vacuum-sealed bag to protect against contamination and moisture.

Outer packaging: Carton or wooden box, depending on size and weight.

Fragile targets: Special protective packaging is used to ensure safe transport.

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