Vanadium nitride sputtering targets are functional targets with high hardness and good thermal stability, suitable for various physical vapor deposition processes. Dense and stable nitride thin films can be prepared using these targets.
We offer vanadium nitride sputtering targets in various sizes and structures. Please contact us for customized solutions and technical support.
Stable sputtering process
High target density
Good film adhesion
Outstanding wear resistance
Reliable thermal stability
Flexible size specifications
Wear-resistant functional film preparation: Suitable for preparing high-hardness, wear-resistant films, effectively improving the wear resistance of substrate surfaces.
Tool and mold surface coating: Vanadium nitride coatings formed by sputtering can improve the stability of tools and molds under high load conditions.
Electronic and functional device thin films: This target can be used for the preparation of functional thin films, meeting the requirements of high structural uniformity and performance consistency in applications.
Scientific research and thin film process research: Commonly used in thin film material and deposition process research, suitable for laboratory and pilot-scale applications.
Q1: Is the vanadium nitride sputtering target stable during sputtering?
A1: Under appropriate process parameters, the target sputtering process is stable, and film formation continuity is good.
Q2: How does target density affect film performance?
A2: Higher density helps obtain films with uniform structure and good adhesion.
Q3: Is this target suitable for long-term continuous sputtering?
A3: Under good cooling and process control conditions, it can meet the requirements for continuous or long-term sputtering.
Q4: What precautions should be taken during use?
A4: It is recommended to install and use it in a clean, dry environment, and with appropriate sputtering parameters.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We have long focused on the preparation and application support of functional sputtering targets, and can stably provide vanadium nitride sputtering targets with reliable structure and consistent performance. We also provide targeted technical advice based on customers’ process conditions to help achieve stable deposition and high-quality thin film preparation.
Molecular Formula: VN
Molecular Weight: 50.94 g/mol
Appearance: Black metallic luster with a smooth surface
Density: 6.04 g/cm³
Melting Point: 2850°C
Crystal Structure: Cubic
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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