| Product ID | Formula | Purity | Dimension | Inquiry |
|---|---|---|---|---|
| 230600ST001 | VC | 99.5% | Ø 25.4mm x 3.175mm | Inquire |
| 230600ST002 | VC | 99.5% | Ø 25.4mm x 6.35mm | Inquire |
| 230600ST003 | VC | 99.5% | Ø 50.8mm x 3.175mm | Inquire |
| 230600ST004 | VC | 99.5% | Ø 50.8mm x 6.35mm | Inquire |
| 230600ST005 | VC | 99.5% | Ø 76.2mm x 3.175mm | Inquire |
| 230600ST006 | VC | 99.5% | Ø 101.6mm x 3.175mm | Inquire |
| 230600ST007 | VC | 99.5% | Ø 101.6mm x 6.35mm | Inquire |
Vanadium carbide sputtering targets are functional targets that combine high hardness and high chemical stability, suitable for various physical vapor deposition processes. Thin films prepared from them exhibit outstanding performance in wear resistance, thermal stability, and structural density.
We offer vanadium carbide sputtering targets in various specifications and with different composition control schemes. Please contact us for customization and technical support.
High-hardness target system
Stable sputtering process
Good film density
Excellent wear resistance
High chemical stability
Customizable specifications and structures
Wear-resistant functional film preparation: Suitable for preparing high-hardness wear-resistant films, significantly improving the service life and wear resistance of substrate surfaces.
High-temperature protective coatings: Utilizing its excellent thermal stability, protective coatings for use in high-temperature environments can be deposited, maintaining structural and performance stability.
Tool and mold surface modification: Forming vanadium carbide films on tool or mold surfaces via sputtering helps reduce the coefficient of friction and improve overall durability.
Functional Materials and Scientific Thin Film Research: This sputtering target is commonly used in the research of functional thin films and novel coating structures, suitable for laboratory and pilot-scale applications.
Q1: Which deposition method is vanadium carbide sputtering target suitable for?
A1: This target is mainly used in physical vapor deposition (PVD) processes. The sputtering process is stable, and the film uniformity is good.
Q2: Is the target prone to cracking during use?
A2: Under reasonable process parameters, the target structure is stable and is not prone to abnormal cracks or detachment.
Q3: How does the target affect the film performance?
A3: The density and compositional uniformity of the target directly affect the film hardness, adhesion, and wear resistance.
Q4: Can it be used for continuous or long-term sputtering?
A4: Yes, it is suitable. Under good cooling and process control conditions, it can meet the requirements of continuous sputtering.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We have extensive experience in functional sputtering target preparation and application support, enabling us to reliably supply vanadium carbide sputtering targets with controllable parameters. We also provide tailored technical advice based on customer process requirements, helping to improve film quality and process stability.
Molecular Formula: Vitamin C
Molecular Weight: 51.01 g/mol
Appearance: Black metallic luster
Density: 3.5 g/cm³
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
