Tungsten Nickel Alloy

Tungsten Nickel Alloy sputtering targets Overview

Tungsten Nickel Alloy sputtering targets are composite materials developed for high-performance coating and film applications. They combine the high melting point of tungsten with the excellent processability and ductility of nickel. Its high density and good conductivity make it excellent in precision electronics, spacecraft coatings and microelectronic packaging.

We provide Tungsten Nickel Alloy in various shapes and sizes, including round, rectangular and customized special-shaped targets to meet the needs of different equipment and processes. At the same time, we provide full-process after-sales technical support. If you have any questions, please feel free to contact us.

Product highlights

Composition ratio: can be adjusted as required
High density: ≥17.0 g/cm³, suitable for high-energy beam stable sputtering
Excellent thermal stability and corrosion resistance
Customized size, composition and microstructure according to requirements
Customized boinding service
Can be used in high vacuum environment and harsh atmosphere conditions

Applications of Tungsten Nickel Alloy sputtering target

Aerospace and defense: used for thermal shielding coatings, magnetron sputtering to prepare protective layers, with excellent resistance to high temperature and mechanical stress.
Semiconductor packaging: used as functional intermediate layer and buffer layer, providing good thermal conductivity and barrier properties.
Optical and functional films: used for deposition of anti-reflection, thermal regulation and electromagnetic shielding films.
Medical imaging equipment: used in high-energy applications such as X-ray source anode targets.

Reports

We provide detailed certificates of analysis (COA), material safety data sheets (MSDS) and necessary compliance certificates for each batch of tungsten-nickel alloy targets. At the same time, we support third-party test reports to ensure international quality standards.