| Product ID | Formula | Purity | Dimension | Inquiry |
|---|---|---|---|---|
| 270800ST001 | Co3O4 | 99.95% | Ø 25.4 mm x 3.175 mm | Inquire |
| 270800ST002 | Co3O4 | 99.95% | Ø 50.8 mm x 3.175 mm | Inquire |
| 270800ST003 | Co3O4 | 99.95% | Ø 50.8 mm x 6.35 mm | Inquire |
| 270800ST004 | Co3O4 | 99.95% | Ø 76.2 mm x 3.175 mm | Inquire |
| 270800ST005 | Co3O4 | 99.95% | Ø 76.2 mm x 6.35 mm | Inquire |
Tricobalt Tetroxide sputtering targets are high-purity, dense ceramic targets specifically designed for physical vapor deposition (PVD) to prepare thin films with specific photoelectric or catalytic properties.
We are committed to providing high-performance Tricobalt Tetroxide targets. Please feel free to contact us for customized product solutions to meet your coating process needs.
Ultra-high density
Precise composition
Excellent strength
Comprehensive technical support
Mature and stable supply
Joint development available for cutting-edge R&D projects
Advanced Display Technology: Used for depositing transparent conductive oxide thin films, it is one of the key materials in the manufacture of touch screens, OLEDs, and other display devices.
Energy Conversion Devices: As an ideal source material for preparing oxygen evolution and hydrogen evolution reaction catalytic films, it is applied in clean energy fields such as water electrolysis for hydrogen production.
Smart Sensing Elements: By sputtering this target, high-performance thin-film sensors sensitive to gases or temperature can be prepared.
Hard protective coating: The resulting film has high hardness and good wear resistance, and can be used for surface strengthening of precision cutting tools and molds, extending their service life.
Q1: What are the options for target bonding?
A1: We mainly provide welding bonding services. We can select different backplate materials (such as oxygen-free copper, molybdenum) and welding processes based on your equipment’s heat dissipation and power requirements.
Q2: How to ensure the uniformity of large-area coatings?
A2: This relies on the extremely high density and structural uniformity of the target itself. Combined with optimized magnetron sputtering processes, we can provide relevant process parameter suggestions to achieve uniform film formation.
Q3: What are the main differences between it and cobalt targets in application?
A3: Cobalt targets deposit cobalt metal films, while Tricobalt Tetroxide targets directly deposit oxide films, avoiding subsequent oxidation steps, making them more suitable for applications requiring precise film chemical states.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
As a professional supplier of Tricobalt Tetroxide sputtering targets, we not only provide rigorously validated products, but also focus on understanding your ultimate goals in thin film processing. With our deep technical expertise and continuous innovation, we are committed to becoming your reliable partner, jointly tackling coating technology challenges, and helping your products achieve superior performance and reliability.
Molecular Formula: Co₃O₄
Molecular Weight: 240.80 g/mol
Appearance: Dark gray to black
Theoretical Density: 6.11 g/cm³
Actual Sintered Density: ≥ 95%
Crystal Structure: Cubic crystal system, spinel structure
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
