Titanium Sulfide sputtering targets are functional materials used for preparing two-dimensional layered films. Through physical vapor deposition (PVD) technology, they enable the formation of uniform TiS₂ films on various substrates. Combining the outstanding electrical and optical properties of TiS₂ with the high efficiency and controllability of sputtering processes, these targets are essential materials for both research and production of functional films.
We offer Titanium Sulfide sputtering targets in multiple specifications, featuring high density and purity. Professional bonding services are available for ceramic targets with various substrate materials. Contact us for customized solutions.
High-purity material
Dense and uniform structure for superior sputtering film quality
Stable sulfur content minimizes process variations
Custom sizing and bonding available
Excellent electrical conductivity
Thin-film battery research: Used for preparing cathodes or solid electrolyte layers in all-solid-state thin-film lithium batteries, where its layered structure facilitates rapid lithium-ion transport.
Optoelectronics and sensing: Deposited Titanium Sulfide films can be used to fabricate functional devices such as photodetectors and gas sensors, benefiting from their excellent semiconductor properties.
Solid Lubrication Coatings: Titanium Sulfide films possess low shear strength and a layered structure, making them suitable as high-performance solid lubrication coatings for precision machinery and harsh environments.
Catalysis and Energy Storage: Serves as a catalyst support or directly as an active catalytic layer in electrocatalytic hydrogen production, electrode modification for energy storage devices, and related fields.
Q1: How is sulfur content stability ensured during TiS₂ target sputtering?
A1: We achieve this through optimized hot-press sintering to produce high-density targets, minimizing abnormal sulfur volatilization during sputtering. Precise control of sputtering parameters (e.g., power, gas pressure) is crucial for maintaining a TiS₂ stoichiometric ratio in the resulting film.
Q2: Can TiS₂ targets be fabricated as rotary targets?
A: Yes. We possess the technical capability to produce TiS₂ ceramic rotary targets, significantly enhancing material utilization and production continuity—particularly suited for large-area coating applications.
Q3: What is the color and conductivity of the film?
A3: TiS₂ films typically exhibit a metallic sheen in dark gold or deep gray. They possess excellent conductivity with low resistivity, making them high-performance conductors—distinct from many other insulating or high-resistance sulfides.
Q4: Are there special storage requirements for TiS₂ targets?
A4: We recommend storing TiS₂ targets in sealed containers within a dry environment. Avoid prolonged exposure to humid air to prevent minor surface oxidation or moisture absorption, which could compromise initial sputtering stability.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We specialize in providing high-performance, highly stable compound sputtering targets. For composition-sensitive materials like TiS₂, we implement full-process precision control from raw material screening to sintering and forming, ensuring chemical homogeneity and structural density in our targets.
Molecular Formula: TiS₂
Appearance: Black target material
Density: Approx. 4.26 g/cm³
Melting Point: Approx. 1100 °C
Crystal Structure: Layered structure, hexagonal crystal system
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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