Titanium Oxide sputtering targets are low-valence titanium oxide targets suitable for preparing functional oxide thin films in physical vapor deposition (PVD) processes. These targets are widely used in research fields related to electronic materials, functional thin films, and transition metal oxides.
We can provide Ti2O3 sputtering targets with stable composition and uniform structure for research and industrial-grade thin film deposition. Please contact us for technical information.
Low-valence titanium oxide targets
Stable composition and crystal phase
Good sputtering process controllability
High film composition consistency
Suitable for various PVD systems
Reliable batch stability
Functional oxide thin films: Commonly used for depositing oxide thin films with specific electrical or structural properties, suitable for functional materials and device research.
Electronic and semiconductor materials research: This target is suitable for the preparation of transition metal oxide thin films, used to study electrical transport behavior, band structure, and interface properties.
Research and Laboratory Thin Film Preparation: Due to its well-defined chemical composition, Ti2O3 thin films are widely used in thin film deposition experiments in universities and research institutions.
Development of Novel Functional Materials: In novel oxide material systems, Ti2O3 thin films are often used as base layers or functional layers to explore material properties.
Q1: What types of thin films are Titanium Oxide sputtering targets mainly used for?
A1: Mainly used for depositing low-valence titanium oxide or related functional oxide thin films, commonly seen in electronic and functional materials research.
Q2: Is atmosphere control required when using Titanium Oxide targets for sputtering?
A2: Yes, oxygen partial pressure or working atmosphere usually needs to be controlled during sputtering to ensure the stability of the valence state and composition of titanium in the thin film.
Q3: Which sputtering methods are suitable for Titanium Oxide sputtering targets?
A3: Generally suitable for RF magnetron sputtering systems, and can also be applied to other PVD processes depending on equipment conditions.
Q4: What is the research value of thin films prepared using Titanium Oxide sputtering targets?
A4: This type of thin film has significant research value in the study of electrical properties, phase transition behavior, and transition metal oxide mechanisms.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We specialize in the stable preparation and quality control of functional oxide sputtering targets, providing reliable material foundation support for Ti₂O₃ thin film deposition.
Molecular Formula: Ti₂O₃
Molecular Weight: 143.88 g/mol
Appearance: Reddish-brown target material
Density: 4.97 g/cm³
Melting Point: 1870 °C
Boiling Point: Approximately 2500 °C
Crystal Structure: Hexagonal (corundum type)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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