Titanium Oxide – Niobium sputtering targets are high-purity, high-density titanium dioxide doped niobium ceramic sputtering targets specifically designed for the preparation of advanced functional films. Primarily used in optical coating, semiconductor, and smart glass applications, it serves as a critical core material for depositing high-performance transparent conductive oxide (TCO) films and dielectric films.
We can customize Titanium Oxide – Niobium composite targets in various sizes, purities, compositions, and bonding methods to meet your specific process requirements. Please inquire for tailored solutions.
High purity and uniform composite
Exceptional film uniformity
High density with low sputtering defects
Superior electrical and optical properties
Support for non-standard customization
Smart Energy-Saving Glass: Used in architectural and automotive applications. Films deposited from this target achieve excellent thermal insulation and light transmission, significantly enhancing energy efficiency.
Flat Panel Displays & Touch Panels: Serves as a complementary or alternative option to ITO targets for fabricating high-transparency, low-resistance electrode layers, improving display clarity and touch sensitivity.
Optical Components: Used to fabricate various anti-reflective coatings, reflective films, and filters, effectively improving imaging quality and performance in optical systems such as lenses and sensors.
Semiconductors and Functional Coatings: Serves as dielectric layers or transparent electrodes in microelectronic devices, while also providing wear-resistant and corrosion-resistant functional protective coatings for tools and instruments.
Q1: What advantages does TiO₂-Nb target material offer compared to traditional ITO targets?
A1: While maintaining excellent conductivity and light transmittance, the doping of niobium (Nb) enhances film stability and mechanical properties. It also reduces costs in certain applications, making it a high-performance alternative to ITO targets.
Q2: What are the typical purity and density of this target material?
A2: Our products typically achieve 99.9% purity, with sintered density exceeding 95% of theoretical density. This ensures stable sputtering processes and superior film formation quality.
Q2: What shapes and bonding methods are available for the target?
A2: We produce various shapes including circular and square, and support different bonding methods such as copper backing plates and aluminum backing plates to accommodate diverse sputtering chamber designs.
Q4: How is the uniformity of the sputtered film composition ensured?
A4: Through advanced powder processing and hot-press sintering techniques, we ensure highly uniform distribution of Ti, Nb, and O elements within the target material, guaranteeing consistent composition across large-area films.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request.
We specialize in the R&D and custom manufacturing of high-performance ceramic sputtering targets, backed by extensive technical expertise. From raw material selection to precision processing, we implement rigorous quality control at every stage to deliver reliable target products that fully meet our customers’ technical specifications.
Molecular formula: TiO₂-Nb
Appearance: White to gray target material
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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