Titanium oxide sputtering targets belong to the Magnéli phase, combining the conductivity of metals with the high-temperature resistance of ceramics. These targets are primarily used to prepare functional thin films with high conductivity, high temperature resistance, and structural stability, and are widely used in electronic devices, conductive ceramics, and the development of scientific thin film materials.
We can provide dense, compositionally uniform Ti4O7 sputtering targets suitable for DC or RF magnetron sputtering systems. Different sizes and processing methods can be provided according to customer equipment requirements to meet the needs of scientific or industrial thin film preparation. Contact us now!
Magnéli Phase Titanium Suboxide Structure
High conductivity, suitable for magnetron sputtering
Excellent thermal stability and thermal shock resistance
Stable composition during sputtering, good film repeatability
Suitable for high-temperature, vacuum, and inert atmosphere deposition
Can be used for functional and structural thin film preparation
Functional Thin Film Deposition: Can be used to prepare highly conductive, high-temperature resistant functional thin films, suitable for electronic devices and special coating applications.
Conductive Ceramics and Composite Thin Films: Utilizing its high conductivity and stability, conductive ceramic and composite thin film materials can be prepared.
Scientific Research and Materials Development: Widely used in the research and development of Magnéli phase materials, conductive oxide thin films, and novel functional thin films.
High-Temperature Corrosion-Resistant Coatings: Ti4O7 thin films exhibit stable performance in high-temperature or corrosive environments and can be used for research on heat-resistant or protective coatings.
Q1: Which sputtering method is the Titanium Suboxide Sputtering Target suitable for?
A1: Suitable for both DC and RF magnetron sputtering systems, exhibiting excellent conductivity and adaptability to various PVD processes.
Q2: Is the Ti₄O₇ target composition stable during sputtering?
A2: Under appropriate process parameters, the target maintains stable composition, resulting in good film repeatability and consistency.
Q3: Can the target withstand high-temperature sputtering conditions?
A3: Yes, the target possesses excellent thermal stability and thermal shock resistance, making it suitable for long-term high-temperature deposition.
Q4: In which research areas are Ti₄O₇ thin films typically applied?
A4: Primarily used for conductive oxide thin films, functional ceramic thin films, high-temperature coatings, and Magnéli phase materials research.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We focus on the research and development and supply of functional ceramics and high-performance sputtering targets, ensuring that Ti₄O₇ sputtering targets meet scientific and industrial standards in terms of material structure, densification, and sputtering compatibility, providing a reliable guarantee for thin film preparation.
Molecular Formula: Ti₄O₇
Molecular Weight: 303.62 g/mol
Appearance: Black target material
Density: Approximately 4.0 g/cm³
Crystal Structure: Monoclinic
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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