Titanium Monoxide Sputtering Targets Overview
Titanium Monoxide sputtering targets are sub-titanium oxide ceramic targets with physical and electrical properties intermediate between metallic titanium and high-valence titanium oxide. They are suitable for preparing functional thin films with specific conductivity, optical absorption, and structural control requirements. This material is commonly used in thin film deposition processes requiring precise control of the titanium oxidation state, and is particularly suitable for PVD magnetron sputtering applications.
We can provide Titanium Monoxide sputtering targets of different specifications and structures according to customer sputtering system and process requirements, and support customized processing services. Please contact us to confirm specific equipment parameters or application scenarios.
Sub-titanium oxide composition, controllable oxidation state
Suitable for PVD processes such as magnetron sputtering
Uniform composition, stable sputtering process
Facilitates precise control of thin film performance
Meets the needs of scientific research and industrial applications
Functional Thin Film Preparation: Can be used to prepare titanium oxide thin films with specific conductivity and optical responses, suitable for functional layers or transition layers.
Electronic and Microelectronic Devices: In electronic devices, TiO₂ thin films can be used for research related to structural control or performance optimization.
Optoelectronic and Optical Research: Titanium Monoxide thin films have research value in light absorption and thin film structure adjustment, and are suitable for exploratory applications in optoelectronic materials.
Q1:What is a Titanium Monoxide sputtering target?:
A:Titanium Monoxide (TiO) sputtering targets are high-purity solid targets used in PVD systems for depositing thin films with excellent electrical and optical properties.
Q2:What is the purity of TiO sputtering targets?
A:Our TiO targets have a purity of ≥99.5%, ensuring minimal contamination and consistent thin film performance in electronic and optical applications.
Q3：Which deposition methods are compatible with TiO targets?
A:TiO targets are compatible with DC and RF magnetron sputtering, allowing deposition on glass, silicon wafers, and metal substrates.
Q4：What are the main applications of Titanium Monoxide films?
A:TiO thin films are used in conductive coatings, dielectric layers, and optical devices such as solar cells, displays, and sensors.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We specialize in supplying functional ceramic and metal sputtering targets, possessing mature material control and processing experience, and can provide research and industrial clients with stable and traceable Titanium Monoxide sputtering target solutions.
Molecular Formula: TiO₂
Appearance: Black target material
Density: Approx. 4.0 g/cm³
Melting Point: Approx. 1830 °C
Crystal Structure: Cubic
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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