Titanium molybdenum alloy sputtering targets are composed of titanium and molybdenum, combining the high strength of titanium with the high temperature resistance and corrosion resistance of molybdenum. These targets are suitable for various physical vapor deposition (PVD) processes for preparing functional metal thin films, corrosion-resistant coatings, and surface treatment materials for microelectronic devices.
We offer uniformly composed and densely structured titanium-molybdenum alloy sputtering targets suitable for DC or RF magnetron sputtering systems. We can customize different sizes, shapes, and bonding methods according to customer needs to meet both research and industrial production requirements.
Alloy design enhances thin film mechanical properties and high temperature and corrosion resistance.
Excellent thin film adhesion and interface stability.
Suitable for various substrates and PVD process conditions.
Stable target composition promotes film consistency.
Supports continuous sputtering and industrial applications.
High Temperature and Functional Metal Thin Films: Suitable for the preparation of high-temperature environments and corrosion-resistant functional thin films.
Composite Coatings and Surface Modification: Used to prepare composite films with both high strength and corrosion resistance, improving surface properties and durability.
Electronic Devices and Microstructure Thin Films: Suitable for high-precision thin film deposition in microelectronic devices and functional surface coatings.
Scientific Research and Process Development: Widely used in universities and research institutions for research on high-performance metal thin films and process parameters.
Q1: What types of thin film applications is the Titanium Molybdenum Alloy Sputtering Target suitable for?
A1: It can be used for the preparation of high-temperature resistant, corrosion-resistant functional thin films and metal composite thin films in microelectronic devices.
Q2: What are the specific effects of molybdenum in alloy targets on thin film properties?
A2: Molybdenum improves the thermal stability and corrosion resistance of thin films and optimizes crystal structure and surface uniformity.
Q3: What sputtering processes is the Titanium Molybdenum Alloy Sputtering Target suitable for?
A3: Suitable for DC magnetron sputtering, RF magnetron sputtering, and multilayer composite thin film deposition processes.
Q4: What are the application advantages of using TiMo thin films?
A4: The thin film possesses high strength, excellent adhesion, and high-temperature and corrosion resistance, making it suitable for functional and engineering applications.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We specialize in titanium-based alloy sputtering targets and advanced thin film materials, emphasizing target density, compositional consistency, and process adaptability. We provide stable and reliable material solutions for titanium-molybdenum alloy thin film deposition.
Molecular Formula: TiMo
Appearance: Silver-gray target material
Density: Approx. 4.5–4.7 g/cm³
Melting Point: Approx. 3030 °C
Crystal Structure: Body-centered cubic (BCC)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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