Titanium metal rotary target is designed for large-area and continuous PVD coating processes, enabling stable and efficient deposition of titanium thin films. It is widely used in flat panel displays, architectural glass coatings, optical films, and industrial surface engineering.
Our titanium rotary targets are engineered for uniform erosion and long service life—reach out to discuss process compatibility and coating performance requirements.
Full-density titanium material
Uniform erosion profile
Long target utilization rate
Stable sputtering behavior
Low defect generation
Suitable for high-power sputtering
Large-area coating capability
Excellent thermal conductivity
Flat Panel Display Coatings:Titanium rotary targets support continuous sputtering in display manufacturing, providing stable film thickness and composition over large substrate areas.
Optical Functional Films:Rotary titanium targets enable uniform deposition of optical layers in large-scale coating systems, improving coating repeatability and throughput.
Industrial Surface Engineering:Titanium coatings produced via rotary sputtering are applied to enhance wear resistance, corrosion protection, and surface functionality of industrial components.
High-Throughput Production Lines:The rotary design allows longer uninterrupted sputtering runs, making titanium rotary targets suitable for mass production environments.
Q1: Why are rotary targets preferred for large-area titanium coating?
A1：Rotary targets provide more uniform erosion and higher material utilization, which helps maintain stable deposition rates across large substrates.
Q2: How does rotary sputtering influence film thickness uniformity?
A2:Continuous rotation ensures even target consumption, reducing thickness variation and improving film consistency during long coating cycles.
Q3: Are titanium rotary targets suitable for high-power operation?
A3:Yes, the rotary structure improves heat dissipation, allowing stable sputtering under higher power densities.
Q4: What coating systems commonly use titanium rotary targets?
A4:They are commonly used in inline sputtering systems for glass coating, display manufacturing, and industrial-scale PVD lines.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We focus on rotary sputtering materials engineered for stability and longevity, supporting consistent titanium film deposition in high-throughput coating environments.
Molecular Formula: Ti
Molecular Weight: 47.87 g/mol
Appearance: Silver-gray dense rotating target tube
Density: 4.51 g/cm³
Melting Point: 1668 °C
Boiling Point: 3287 °C
Crystal Structure: Hexagonal close-packed (α-Ti, hcp)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
