ULPMAT

Titanium Iodide

Chemical Name:
Titanium Iodide
Formula:
TiI4
Product No.:
225300
CAS No.:
7720-83-4
EINECS No.:
231-754-0
Form:
Powder
HazMat:
Class 4.1 / UN1871 / PG II
Product ID Formula Purity Dimension Inquiry
225300PD001 TiI4 99.99% -100 Mesh Inquire
225300PD002 TiI4 99.999% -100 Mesh Inquire
Product ID
225300PD001
Formula
TiI4
Purity
99.99%
Dimension
-100 Mesh
Product ID
225300PD002
Formula
TiI4
Purity
99.999%
Dimension
-100 Mesh

Titanium Iodide Powder Overview 

Titanium Iodide powder is a high-purity titanium halide material with high volatility and excellent thermal decomposition properties, suitable for various material preparation and research fields. This powder is widely used in functional thin film preparation, chemical vapor deposition (CVD), physical vapor deposition (PVD), and scientific research and development, serving as a precursor material for Ti compound thin films.

We can provide high-purity, uniformly sized TiI₄ powder, suitable for scientific experiments and industrial thin film preparation. Different packaging specifications and technical support can be provided according to customer needs.

Product Highlights

High purity, uniform particle distribution
High volatility, suitable for high-precision thin film preparation
Excellent thermal decomposition properties, producing high-quality Ti compounds
Suitable for scientific research and industrial applications
Safe and controllable operating procedures provided

Applications of Titanium Tetraiodide Powder

Functional Thin Film Preparation: Can be used as a precursor for Ti compound thin films in the preparation of optical, electronic, and functional coatings.
Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD): Suitable for high-precision thin film deposition processes, producing uniform and dense Ti-based thin films.
Research and Materials Development: Widely used in universities, research institutions, and laboratories for research on Ti compound thin films and related processes.

FAQs

Q1: What are the main uses of TiI4 powder in thin film preparation?
A1: As a precursor for Ti compound thin films, it is used for the preparation of functional thin films and high-precision coatings.

Q2: What are the main advantages of TiI4 powder?
A2: Its high purity and volatility are beneficial for the uniform deposition of high-quality thin films.

Q3: Is TiI₄ powder suitable for research or industrial applications?
A3: It is suitable for both research experiments and small-scale industrial thin film preparation.

Q4: What safety precautions should be taken when using TiI4 powder?
A4: It should be operated in a dry, sealed environment, avoiding contact with moisture, and following safety operating procedures.

Reports

Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports available upon request

Why Choose Us?

We specialize in titanium-based compound powders and sputtering targets, emphasizing powder purity, particle uniformity, and process adaptability. We provide stable and reliable material solutions for TiI₄ powder in both scientific research and industrial thin film preparation.

Molecular Formula: TiI₄
Molecular Weight: 484.12 g/mol
Appearance: Yellow or red powder
Density: Approx. 4.26 g/cm³
Melting Point: Approx. 130 °C
Boiling Point: Approx. 332 °C
Crystal Structure: Orthorhombic

Signal Word:
Danger
Hazard Statements:
H303: May be harmful if swallowed
H314: Causes severe skin burns and eye damage

Inner Packaging: Double-layer sealed plastic bags or aluminum foil bags for moisture and leakage protection.
Outer Packaging: Iron drum or fiber drum, depending on the weight, with reinforced sealed lid.
Hazard Packaging: UN-certified packaging compliant with regulations for hazardous materials transportation.

SKU 225300PD Category Tags: Brand:

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