| Product ID | Formula | Purity | Dimension | Inquiry |
|---|---|---|---|---|
| 220805ST001 | TiO2 | 99.9% | Ø 50.8mm x 3.175mm | Inquire |
| 220805ST002 | TiO2 | 99.95% | Ø 50.8mm x 6.35mm | Inquire |
| 220805ST003 | TiO2 | 99.95% | Ø 101.6mm x 3.175mm | Inquire |
| 220805ST004 | TiO2 | 99.95% | Ø 203.2mm x 6.35mm | Inquire |
| 220805ST005 | TiO2 | 99.9% | 1650mm ×130mm ×6mm | Inquire |
| 220805ST006 | TiO2 | 99.995% | Ø 50.8mm x 6.35mm | Inquire |
| 220805ST007 | TiO2 | 99.995% | Ø 76.2mm x 3.175mm | Inquire |
| 220805ST008 | TiO2 | 99.995% | Ø 101.6mm x 3.175mm | Inquire |
Titanium dioxide sputtering targets are commonly used oxide ceramic targets with excellent chemical and thermal stability, suitable for various physical vapor deposition (PVD) processes.
We offer Titanium Dioxide sputtering targets in various sizes and structures, including planar and circular targets, and support custom processing services. Contact us to customize your products.
Oxide ceramic target with excellent chemical stability
Suitable for PVD processes such as RF magnetron sputtering
Stable sputtering process, beneficial for film uniformity
Suitable for continuous deposition and processes with high repeatability requirements
Meets the needs of scientific research and industrial applications
Optical Thin Film Deposition: Commonly used to prepare optical thin films, such as refractive index control layers and functional optical coatings.
Electronic and Microelectronic Devices: In electronic devices, titanium dioxide thin films can be used as dielectric or functional layer materials for device structure optimization.
Surface Engineering and Functional Coatings: TiO₂ films deposited by sputtering exhibit good stability and are suitable for surface modification and protective coating applications.
Q1: Which sputtering method is best suited for Titanium Dioxide sputtering targets?
A1: Generally suitable for RF magnetron sputtering systems. The specific process method needs to be determined based on equipment configuration and process parameters.
Q2: When using TiO₂ sputtering targets, are film performance easily affected by process conditions?
A2: Film performance is closely related to sputtering power, atmosphere, and substrate conditions. Stable process control helps to obtain consistent and good film results.
Q3: Are titanium dioxide sputtering targets stable during long-term use?
A3: High-density TiO₂ sputtering targets have good structural stability under reasonable process conditions and are suitable for continuous or multi-batch deposition applications.
Q4: What precautions should be taken when storing and transporting Titanium Dioxide sputtering targets?
A4: It is recommended to store in a dry, clean environment in a sealed container, avoiding moisture, mechanical impact, or surface contamination to ensure stable condition before use.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We specialize in supplying sputtering targets and thin film deposition materials, possessing mature experience in ceramic target processing and quality control, and can provide customers with stable and reliable Titanium Dioxide sputtering target solutions.
Molecular Formula: TiO₂
Molecular Weight: 79.87 g/mol
Appearance: White target material
Density: Approx. 4.23 g/cm³
Melting Point: Approx. 1843 °C
Crystal Structure: Tetragonal (Rutile type)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
