Titanium Carbonitride sputtering targets are composed of titanium carbide and titanium nitride, combining the high hardness, wear resistance, and excellent thermal stability of both ceramic materials. Through composite system design, this target exhibits a more balanced performance in terms of film density, mechanical properties, and service stability, and is widely used in the preparation of wear-resistant coatings, functional thin films, and high-requirement engineering coatings.
We can provide dense, uniformly distributed TiC–TiN sputtering targets suitable for DC or RF magnetron sputtering systems. We can also provide target products of different sizes, shapes, and bonding schemes according to equipment requirements, supporting both research and industrial applications.
Combines the high hardness and wear resistance of TiC and TiN
Good high-temperature stability, suitable for medium-to-high power sputtering applications
Balanced thin film mechanical properties and structural stability
Compositional composite design helps improve the overall performance of the thin film
Suitable for various PVD thin film deposition processes
Wear-resistant and Protective Coatings: Commonly used to prepare wear-resistant coatings with high hardness and low coefficient of friction, suitable for the surfaces of cutting tools, molds, and mechanical parts.
Functional and Engineering Thin Films: In functional coatings and engineering applications, this target can be used to obtain composite thin film structures that balance hardness and stability.
High-Temperature and Harsh Environment Thin Films: Suitable for research and application of thin film materials used under high-temperature, frictional, or complex service conditions.
Scientific Research and Process Development: Widely used in universities, research institutions, and laboratories for optimizing novel composite thin film materials and sputtering process parameters.
Q1: What sputtering methods is the Titanium Carbonitride sputtering target suitable for?
A1:This target can generally be used for DC magnetron sputtering or RF magnetron sputtering, depending on the equipment configuration and process requirements.
Q2: What thin film properties can be obtained using Titanium Carbonitride targets?
A2: Deposited thin films typically exhibit high hardness, good wear resistance, and stable structural properties.
Q3: Are Titanium Carbonitride sputtering targets suitable for high-power sputtering?
A3: Due to its good thermal stability and dense structure, it is suitable for high-power-density sputtering processes under appropriate process conditions.
Q4: Does using composite targets during sputtering contribute to the stability of the film composition?
A4: Under stable target quality and process parameter control, composite targets help obtain composite thin films with relatively uniform composition.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We have long focused on sputtering targets and advanced inorganic materials, emphasizing target density, compositional consistency, and process adaptability, and can provide you with stable and reliable material solutions for TiC–TiN composite thin film deposition.
Molecular formula: TiC-TiN
Appearance: Black or dark gray target material
Crystal structure: Cubic (NaCl type structure)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
