Titanium Carbide-Titanium Dioxide sputtering targets are composed of titanium carbide and titanium dioxide, combining the high hardness and high conductivity of TiC with the chemical stability and oxide film properties of TiO₂. This composite target can be used to control the mechanical properties, electrical properties, and surface functionality of thin films, and is widely used in the preparation of functional coatings, wear-resistant films, and multifunctional composite films.
We can provide TiC–TiO2 sputtering targets with uniform composition and dense structure, suitable for DC or RF magnetron sputtering processes. We can also provide different sizes, shapes, and bonding solutions according to customer equipment requirements to meet research and industrial applications.
Combining the high hardness of TiC with the functional oxide properties of TiO₂
The composite design helps control the electrical and mechanical properties of the thin film.
Good chemical stability and environmental adaptability. Dense target structure, suitable for stable sputtering processes.
Applicable to various PVD thin film deposition processes.
Wear-resistant and Functional Composite Coatings: Can be used to prepare composite thin films with both wear resistance and surface functionality, suitable for mechanical parts and engineering surfaces.
Functional Oxides and Composite Thin Films: Through composite sputtering, thin film structures that balance mechanical properties and functional characteristics can be obtained, for research on functional devices and engineering applications.
Surface Engineering and Material Modification: Suitable for material systems requiring simultaneous improvement of surface hardness, stability, and functional response.
Research and Process Development: Widely used in universities, research institutions, and laboratories for research on composite thin film systems and optimization of process parameters.
Q1: What are the main characteristics of Titanium Carbide-Titanium Dioxide sputtering targets?
A1: This target material achieves synergistic optimization of the mechanical and functional properties of the thin film through a composite design of carbide and oxide.
Q2: Which sputtering methods is the Titanium Carbide-Titanium Dioxide target suitable for?
A2: It can typically be used for DC magnetron sputtering or RF magnetron sputtering, depending on the equipment conditions and process requirements.
Q3: What performance advantages do thin films deposited using this target material possess?
A3: The thin films typically exhibit good abrasion resistance, chemical stability, and tunable electrical or surface functional properties.
Q4: Does the composite target material help improve the structural stability of the thin film?
A4: Composite system design helps improve the overall structural stability and service reliability of the thin film.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We specialize in composite sputtering targets and advanced inorganic materials, emphasizing target density, compositional consistency, and process adaptability. We provide stable and reliable material solutions for TiC–TiO2 composite thin film deposition.
Molecular formula: TiC-TiO₂
Appearance: Grayish-black to dark gray target material
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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