Titanium carbide sputtering targets are advanced ceramic targets with high hardness and high melting point, possessing excellent wear resistance, chemical stability, and electrical conductivity, suitable for various physical vapor deposition (PVD) processes. These targets are widely used in the preparation of wear-resistant thin films, functional coatings, and high-temperature stable thin films.
We can provide titanium carbide sputtering targets with uniform composition and dense structure, suitable for DC or RF magnetron sputtering systems. For customized sizes, shapes, or bonding solutions, please contact us for technical support and application advice.
High melting point, suitable for high-power and high-temperature sputtering conditions
High hardness, resulting in thin films with excellent wear resistance
Good chemical stability and corrosion resistance
Possessing certain electrical conductivity, suitable for various sputtering modes
Stable composition, beneficial for consistent thin film composition
Wear-resistant and Protective Coatings: Commonly used to prepare high-hardness, low-wear protective coatings, suitable for the surfaces of cutting tools, molds, and mechanical parts.
Functional Thin Films and Engineering Coatings: In the fields of microelectronics, sensors, and functional devices, titanium carbide thin films provide excellent structural stability and functional support.
High-Temperature and Extreme Environment Thin Films: Suitable for research and application of thin film materials used in high-temperature or corrosive environments.
Scientific Research and Materials Development: Widely used in thin film material development and process optimization in universities, research institutions, and laboratories.
Q1: What sputtering processes are titanium carbide sputtering targets mainly used for?
A1: Commonly used in DC magnetron sputtering and RF magnetron sputtering processes, depending on equipment configuration and process requirements.
Q2: What types of thin films can be deposited using titanium carbide targets?
A2: Mainly used for depositing wear-resistant thin films, protective coatings, and functional thin films with high-temperature stability.
Q3: What are the typical properties of titanium carbide thin films?
A3: Typically exhibit high hardness, good wear resistance, chemical stability, and structural stability under high-temperature conditions.
Q4: Are titanium carbide sputtering targets suitable for high-power sputtering?
A4: Due to its high melting point and good thermal stability, titanium carbide targets are suitable for high power density sputtering applications.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We specialize in sputtering targets and advanced inorganic materials, emphasizing target density, compositional uniformity, and application compatibility. We can provide stable and reliable material solutions for your thin film deposition processes.
Molecular Formula: TiC
Molecular Weight: 59.88 g/mol
Appearance: Black target material
Density: Approx. 4.93 g/cm³
Melting Point: Approx. 3140 °C
Crystal Structure: Cubic (NaCl type structure)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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