Tin(II) Oxide

Tin(II) oxide sputtering targets Overview

Tin(II) oxide sputtering targets are high-performance materials designed for advanced thin film deposition processes. They are widely used in transparent electronic devices, gas sensors, lithium batteries, and functional thin films. These materials offer excellent conductivity, low carrier concentration, and excellent film uniformity, meeting the demands of a wide range of cutting-edge technologies.

We offer Tin(II) oxide sputtering targets in a variety of shapes and sizes, including round, rectangular, and ring-shaped, and can be customized to meet your specific application requirements. We also provide comprehensive after-sales technical support to help customers achieve stable mass production.

Product Highlights

Purity: 99.99%
Low impurity content ensures stable film performance
Dense structure, excellent sputtering rate and film uniformity
Customizable size, thickness, and mounting method
Suitable for the preparation of transparent conductive films and gas sensors

Applications of Tin(II) oxide sputtering target

Transparent electronic devices: Used as a p-type transparent conductive film material in TFT displays and organic light-emitting devices (OLEDs).
Gas sensors: Used for the preparation of highly sensitive SnO-based gas sensors for detecting gases such as CO and NO₂. Electrochemical Devices: Used as a coating for anode materials in lithium-ion batteries to improve cycling stability.
Optoelectronic and Functional Thin Films: Used in specialized applications such as infrared filters and low-emissivity glass.

Reports

We provide a Certificate of Analysis (COA), Material Safety Data Sheet (MSDS), and other relevant reports with each shipment. We also support third-party testing for enhanced quality assurance.