Thulium metal sputtering targets are high-purity rare earth metal materials developed specifically for advanced thin film deposition processes. They are suitable for a variety of PVD processes such as magnetron sputtering, ion beam deposition, and electron beam evaporation. With a purity of up to 99.9%, dense metal structure, and uniform film formation, high-purity Thulium metal sputtering targets are particularly suitable for high-tech fields such as magneto-optical materials, infrared windows, laser devices, and functional films for research.
We can provide Thulium metal sputtering targets in various shapes and sizes, including round, rectangular, and special-shaped targets, and also support customized specifications to adapt to customer equipment. We provide a full range of technical support services, including target binding services, to help customers achieve a smooth transition from experiment to mass production.
Purity: 99.9%
High-density structure: optimizes uniformity of thin film deposition
Rare earth metal characteristics: paramagnetism, good infrared reflectivity, high atomic number
Customization support: size, shape, backplane, mounting holes, etc. can be flexibly customized according to needs
Strong compatibility: adapt to mainstream vacuum coating equipment and R&D platforms
Binding: can provide target binding and backplane processing
Magneto-optical materials: used to prepare thin film materials such as magneto-optical storage and optical isolators to improve magneto-optical response
Infrared optics: used for mid- and far-infrared windows and coatings to improve thermal reflection and absorption control capabilities
Laser and fluorescent devices: used as doping elements or activated film layers in near-infrared lasers
Material science research: as a rare earth metal source, used to prepare multi-element alloys, superlattice structures and functional composite films
We provide detailed certificates of analysis (COA), material safety data sheets (MSDS) and other relevant documents for each batch of thulium metal sputtering targets to ensure that the products meet the quality requirements of high purity and high consistency. At the same time, we support third-party testing services to improve project reliability and transparency.
Molecular formula: Tm
Appearance: Silver-white metal target, fine texture, smooth surface without cracks
Density: about 9.3 g/cm³ (close to theoretical density)
Melting point: about 1,545 °C
Crystal structure: hexagonal close packing (hcp)
Chemical stability: slowly oxidizes in air
Mechanical properties: soft texture (Vickers hardness about 500 MPa), good processability, suitable for cold pressing and machining into targets
Signal Word:
Danger
Hazard Statements:
H228: Flammable solid
H260: In contact with water releases flammable gases which may ignite spontaneously
Inner packaging: Vacuum-sealed bag to protect against contamination and moisture.
Outer packaging: Carton or wooden box, depending on size and weight.
Fragile targets: Special protective packaging is used to ensure safe transport.
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