Tellurium (IV) Oxide

Tellurium Oxide sputtering targets Overview

Tellurium Oxide sputtering targets are high-performance ceramic materials designed for functional thin film deposition. Their high purity and excellent density enable excellent film composition control, film uniformity, and extremely low impurity content. They are widely used in acousto-optic devices, infrared optics, optical waveguides, and nonlinear optics.

We offer a variety of Tellurium Oxide sputtering targets in various sizes, including round, rectangular, and ring shapes, and can be customized to meet your specific needs. We also provide comprehensive technical support and after-sales service. If you have any questions, please feel free to contact us.

Product Highlights

Purity: 99.99%
High-density ceramic structure for excellent film uniformity
Customizable shapes and sizes for compatibility with a variety of equipment systems
Target bonding available
Suitable for optoelectronic devices, infrared materials, acousto-optic modulators, and specialty optical coatings.

Applications of Tellurium Oxide sputtering target

Acousto-optic devices: Utilizing the excellent acousto-optic properties of TeO₂, Tellurium (IV) Oxide sputtering targets are used in the manufacture of acousto-optic modulators and acousto-optic deflectors. Optical Thin Films: TeO₂ thin films are deposited in infrared windows and waveguide devices, exhibiting high refractive index and low absorption properties.
Nonlinear Optics: Suitable for the preparation of nonlinear optical materials in frequency conversion devices.
Optical Communications and Integrated Optical Circuits: Used as active or passive layers in optical waveguides, improving signal transmission efficiency.

Reports

We provide a Certificate of Analysis (COA), Material Safety Data Sheet (MSDS), and related compliance documentation for each batch of TeO₂ sputtering targets. We also support customer-specified third-party testing to ensure traceability and consistent quality.