Tantalum Phosphide powder is a high-performance functional material with excellent electrical properties and chemical stability. It has high purity and uniform particles, and is suitable for electronic devices, cemented carbide and high-temperature wear-resistant materials.
We provide Tantalum Phosphide powder with various particle sizes to meet different process requirements, and can customize packaging and technical support according to customer requirements. We also provide comprehensive after-sales service. If you have any questions, please feel free to contact us.
Purity: 99.9%
High density, uniform particles, easy to disperse evenly
Customizable particle size distribution and packaging specifications
Suitable for electronic device manufacturing, cemented carbide preparation and high-temperature wear-resistant coatings
Electronic devices: used as a key component in semiconductors and superconducting materials, showing good conductivity and thermal stability.
Cemented carbide: As an important raw material for tantalum-based cemented carbide, it improves the hardness and wear resistance of the material.
High-temperature coating: used for protective coatings in high-temperature environments to improve equipment life and stability.
Catalytic material: a carrier for some synthetic catalysts, showing good chemical stability and catalytic activity.
We provide detailed Certificate of Analysis (COA), Material Safety Data Sheet (MSDS) and related test reports for each batch of goods to ensure stable and reliable product quality. We also support third-party testing services to provide customers with higher confidence.
Molecular formula: TaP
Molecular weight: 182.96 g/mol
Appearance: Dark gray to black powder, dense granular
Density: about 14.1 g/cm³ (close to theoretical density)
Melting point: about 3,430 °C
Crystal structure: cubic phase (sphalerite structure)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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