| Product ID | Formula | Purity | Dimension | Inquiry |
|---|---|---|---|---|
| 730800ST001 | Ta2O5 | 99.95% | Ø 50.8 mm x 3.175 mm | Inquire |
| 730800ST002 | Ta2O5 | 99.95% | Ø 76.2 mm x 3.175 mm | Inquire |
| 730800ST003 | Ta2O5 | 99.95% | Ø 101.6 mm x 6.35 mm | Inquire |
| 730800ST004 | Ta2O5 | 99.995% | Ø 25.4 mm x 6.35 mm | Inquire |
| 730800ST005 | Ta2O5 | 99.995% | Ø 50.8 mm x 3.175 mm | Inquire |
| 730800ST006 | Ta2O5 | 99.995% | Ø 50.8 mm x 6.35 mm | Inquire |
| 730800ST007 | Ta2O5 | 99.995% | Ø 76.2 mm x 3.175 mm | Inquire |
| 730800ST008 | Ta2O5 | 99.995% | Ø 101.6 mm x 6.35 mm | Inquire |
| 730800ST009 | Ta2O5 | 99.995% | Ø 203.2 mm x 6.35 mm | Inquire |
Tantalum pentoxide sputtering targets are a key material widely used in microelectronics, optoelectronics, and precision optics. Their high dielectric constant, excellent optical transparency, and thermal stability enable them to demonstrate exceptional performance in next-generation electronic devices.
We offer a variety of tantalum pentoxide sputtering targets in various sizes and shapes, including round and rectangular shapes, which can be customized to meet customer application requirements. We also provide comprehensive technical support and after-sales service to ensure efficient and reliable material use.
Purity: 99.95% to 99.995%
High dielectric properties for advanced electronic devices
Excellent chemical stability for harsh environments
Customizable sizes and specifications to accommodate a variety of sputtering equipment
Target bonding services available
Low particle shedding rate for improved film quality
Semiconductor Devices: Used as a high-k gate oxide material for CMOS devices and DRAM capacitors.
Optical Thin Films: Used as a high-refractive-index material in optical components such as interference filters and antireflection coatings.
Data Storage: Used as a functional oxide layer in resistive random access memory (RRAM). Solar cells: Serves as an antireflection layer or buffer layer, improving light absorption efficiency and device stability.
We provide a detailed Certificate of Analysis (COA), Material Safety Data Sheet (MSDS), and relevant technical reports for each batch of Ta₂O₅ sputtering targets. We also support independent testing services from third-party institutions to further enhance quality assurance.
Molecular Formula: Ta₂O₅
Molecular Weight: 441.89 g/mol
Appearance: White, dense ceramic target with a smooth surface
Density: Approximately 8.2 g/cm³ (close to theoretical density)
Melting Point: Approximately 1,880°C
Crystal Structure: Monoclinic
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
