Strontium Vanadate sputtering targets are commonly used to prepare optical thin films, functional oxide thin films, and research coatings for optoelectronic devices.
We offer a variety of Strontium Vanadate sputtering targets, including ceramic targets, hot-pressed targets, standard sizes, and special sizes. Density, purity, and dimensional parameters can be customized to suit different deposition equipment and process conditions. During target processing, density and microstructure uniformity are strictly controlled to ensure excellent film deposition rates and stability. Please contact us for more detailed information.
High-density ceramic structure
Good film uniformity
Low impurity content, stable output
Supports multiple sputtering processes
Excellent heat and crack resistance
Target bonding available
Custom sizes available
Used for preparing optical thin films to improve the performance of optical devices.
Used for research on functional oxide thin films to meet the needs of multi-structure exploration.
Used for coatings for optoelectronic devices to improve thin film response characteristics.
Used for material verification and performance testing in laboratories and pilot lines.
Q1: Does the density of the Strontium Vanadate target significantly affect the thin film?
A1: Higher density results in a more stable sputtering process, significantly reducing particle detachment and improving film uniformity.
Q2: Is the target suitable for high-power magnetron sputtering equipment?
A2: The target structure is optimized to withstand higher energy densities and is suitable for various types of magnetron sputtering systems.
Q3: Can the target edges be specially processed according to the equipment structure?
A3: Yes, chamfering, backplate welding, and special shapes can be customized according to the cavity and target holder structure.
Q4: What should be done if arcing occurs during sputtering?
A4: This is usually related to the cavity atmosphere or target surface condition. Adjusting the gas pressure and power, and performing target surface pretreatment, should improve the situation.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports available upon request
We have long focused on the manufacturing of functional oxide sputtering targets. Through stable formulation control, precise sintering processes, and rigorous testing procedures, we provide reliable sputtering target supplies to various research teams and thin film production users. We support rapid delivery, technical consultation, and customized services, ensuring consistent and reliable support from material selection to process application, enabling your thin film projects to progress more efficiently and stably.
Chemical Formula: Sr₂V₂O₇
Molecular Weight: 247.87 g/mol
Appearance: White to off-white ceramic sputtering target
Crystal Structure: Tetragonal (pyrosalt-type)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
