| Product ID | Formula | Purity | Dimension | Inquiry |
|---|---|---|---|---|
| 38220800ST001 | SrTiO3 | 99.9% | Ø 25.4 mm x 3.175 mm | Inquire |
| 38220800ST002 | SrTiO3 | 99.9% | Ø 50.8 mm x 3.175 mm | Inquire |
| 38220800ST003 | SrTiO3 | 99.9% | Ø 50.8 mm x 6.35 mm | Inquire |
| 38220800ST004 | SrTiO3 | 99.9% | Ø 76.2 mm x 6.35 mm | Inquire |
| 38220800ST005 | SrTiO3 | 99.9% | Ø 101.6 mm x 3.175 mm | Inquire |
| 38220800ST006 | SrTiO3 | 99.9% | 34 mm x 36.9 mm x 6mm | Inquire |
Strontium Titanium Oxide sputtering targets are high-purity ceramic targets with excellent thermal stability, chemical inertness, and uniform electrical properties. They are widely used in electronic thin film deposition, functional oxide devices, and the fabrication of high-performance ceramic coatings.
We offer SrTiO3 sputtering targets in various specifications, sizes, and purity grades to meet the needs of DC, RF, and magnetron sputtering equipment. Please contact us for samples or custom services.
High purity
High density, low porosity
Good thermal expansion coefficient matching
Uniform electrical and optical properties
Suitable for DC/RF/magnetron sputtering
High stability, long service life
Supports target bonding
Customizable sizes and shapes
Good batch consistency
Electronic Thin Film Deposition: Used to prepare high-quality SrTiO3 thin films, improving device performance and stability.
Functional Oxide Devices: Can be used for thin film fabrication of multilayer oxide capacitors, resistors, and sensor materials.
Ceramic Coatings: As a ceramic coating material, it enhances mechanical strength and thermal stability.
Scientific Material Development: Provides a uniform and reliable deposition basis in the research and development of ferroelectric, piezoelectric, and optoelectronic materials.
Q1: Can SrTiO3 sputtering targets be used directly in all types of sputtering equipment?
A1: This target is suitable for DC, RF, and magnetron sputtering, but please select the appropriate specifications according to the equipment power and vacuum conditions.
Q2: Will the density and porosity of the target affect the deposition effect?
A2: Yes, high target density and low porosity ensure uniform deposition and a stable sputtering rate, improving film quality.
Q3: What precautions should be taken when transporting and storing the target?
A3: It should be stored in a dry, light-proof, and impact-resistant environment to avoid moisture and mechanical damage.
Q4: How to ensure consistent performance between different batches of targets?
A4: Each batch of sputtering targets undergoes rigorous chemical composition and density testing to ensure consistent dimensions, density, and sputtering performance.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports available upon request
We possess mature SrTiO3 sputtering target production processes and a stringent quality control system, providing high-purity, high-density, and stable targets, along with professional technical services. This ensures reliable application of our materials in thin film preparation and functional device development, making us the preferred partner for research and industrial applications.
Chemical Formula: SrTiO₃
Molecular Weight: 183.49 g/mol
Appearance: White to off-white ceramic sputtering target
Density: ~5.11 g/cm³
Melting Point: ~2,530 °C
Crystal Structure: Cubic perovskite-type
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
