High-purity Strontium Ruthenium Oxide sputtering targets are suitable for the fabrication of functional thin films and electronic devices.
We offer high-density SrRuO3 sputtering targets in various specifications, suitable for scientific research and industrial thin film deposition. Contact us for samples or to customize target sizes. We provide professional technical support and after-sales service.
High purity
Dense and uniform, non-porous
Excellent electrical conductivity and thermal stability
Easy sputtering deposition
Supports various target shapes and sizes
Target bonding services available
Chemically stable
Meets the needs of scientific research and industrial thin films
Strong customization production capability
Preparation of conductive thin films in electronic devices.
Achieving high-performance conductive layers in functional ceramic thin films.
Used in superconducting materials and related scientific research experiments.
Preparation of multilayer composite films or optical thin films to improve material properties.
Q1: Which deposition processes are SrRuO3 sputtering targets suitable for?
A1: Suitable for various thin film fabrication processes such as DC magnetron sputtering (DC), RF sputtering, and pulsed laser deposition (PLD).
Q2: How should the target be stored to maintain its performance?
A2: Store in a dry, cool, and sealed environment, avoiding moisture and prolonged exposure to air.
Q3: Can the target size and shape be customized?
A3: We can customize round targets, square targets, and thickness specifications according to customer needs to ensure compliance with different deposition equipment requirements.
Q4: How do you guarantee the uniformity and purity of the target?
A4: Each batch of targets undergoes chemical composition analysis and density testing to ensure uniformity and high purity, suitable for scientific research and industrial applications.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports available upon request
We possess mature high-density SrRuO3 target preparation technology and a comprehensive quality control system, providing customizable, high-purity, and stable sputtering targets, along with professional technical services to ensure reliable results in scientific research and industrial thin film preparation.
Chemical Formula: SrRuO₃
Molecular Weight: 213.06 g/mol
Appearance: Dark gray to black ceramic sputtering target
Density: ~6.5 g/cm³
Melting Point: ~1,350 °C (approx., decomposes before melting)
Crystal Structure: Orthorhombic perovskite-type
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us