Strontium Aluminum Oxide sputtering targets are functional materials used to prepare highly stable oxide thin films, suitable for optoelectronic devices, insulating structures, and materials research.
We offer high-purity, high-density Sr4Al2O7 sputtering targets, with customization options available. Our molding and sintering technologies ensure dense target structures, minimal arcing during film deposition, and stable discharge. We can also provide recommendations based on customer equipment power and deposition requirements. Please feel free to contact us if you require technical support.
High-density structure
Controllable purity, low impurities
Good discharge stability
Customizable processing available
Multiple sizes to match various cavities
Excellent film uniformity
Controllable upper limit for surface flatness
Supports target bonding
Sturdy packaging, safe transportation
Can be used for sputtering optical thin films, improving film stability and light transmittance.
Suitable for preparing insulating thin films, improving device breakdown strength.
Used in the development of functional oxides to construct complex thin-film systems.
Used in novel display materials, sensing structures, or laboratory material exploration projects.
Q1: Are there any requirements for sputtering power for Sr4Al2O7 targets?
A1: To ensure film quality, it is recommended to initiate the arc at low to medium power and then gradually increase the power to avoid stress concentration that could cause localized damage to the target.
Q2: Are these Sr4Al2O7 targets prone to cracking?
A2: We reduce the internal stress of the target by optimizing powder particle size, sintering parameters, and cooling processes, thereby reducing the risk of cracking.
Q3: Can the target be welded to a metal backplate?
A3: Appropriate backplate welding methods, including metal brazing or diffusion welding, can be selected based on the customer’s equipment to improve heat dissipation and mechanical stability.
Q4: How to determine if the target needs replacement?
A4: When the target surface shows deepened edge grooves, uneven wear, or abnormal discharge, it should be replaced promptly to ensure film quality and deposition safety.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports available upon request
We possess mature powder control technology, sintering processes, and finishing capabilities in oxide target manufacturing, ensuring that Sr4Al2O7 targets exhibit excellent density, uniformity, and stability, providing customers with consistent thin film deposition performance. We support rapid customization, technical consultation, professional packaging, and global shipping. We can adjust target parameters according to different equipment brands and process requirements, providing reliable assurance for your experiments and production. Whether for research institutions or industrial customers, we can provide long-term, stable, and repeatable product quality and professional services.
Chemical Formula: Sr₄Al₂O₇
Molecular Weight: 348.80 g/mol
Appearance: White to off-white ceramic sputtering target
Crystal Structure: Tetragonal
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
