| Product ID | Formula | Purity | Dimension | Inquiry |
|---|---|---|---|---|
| 140800ST001 | SiO | 99.9% | Ø 25.4mm x 3.175mm | Inquire |
| 140800ST002 | SiO | 99.9% | Ø 25.4mm x 6.35mm | Inquire |
| 140800ST003 | SiO | 99.9% | Ø 50.8mm x 3.175mm | Inquire |
| 140800ST004 | SiO | 99.9% | Ø 50.8mm x 6.35mm | Inquire |
| 140800ST005 | SiO | 99.9% | Ø 76.2mm x 3.175mm | Inquire |
| 140800ST006 | SiO | 99.9% | Ø 76.2mm x 6.35mm | Inquire |
| 140800ST007 | SiO | 99.99% | Ø 25.4mm x 3.175mm | Inquire |
| 140800ST008 | SiO | 99.99% | Ø 25.4mm x 6.35mm | Inquire |
| 140800ST009 | SiO | 99.99% | Ø 50.8mm x 3.175mm | Inquire |
| 140800ST010 | SiO | 99.99% | Ø 50.8mm x 6.35mm | Inquire |
| 140800ST011 | SiO | 99.99% | Ø 76.2mm x 3.175mm | Inquire |
| 140800ST012 | SiO | 99.99% | Ø 76.2mm x 6.35mm | Inquire |
Silicon Monoxide sputtering targets are ceramic targets used for functional thin film deposition, exhibiting excellent thermal stability and uniform deposition characteristics. They are widely used in the fabrication of electronic devices, functional coatings, and optical thin films.
We can provide process-compatible Silicon Monoxide sputtering targets and support technical integration of target structure and deposition parameters. Contact us now!
Uniform and stable film composition
High thermal stability
Good deposition uniformity
Strong process compatibility
Suitable for various sputtering processes
Functional Thin Film Fabrication: SiO targets are suitable for fabricating electronic devices and optical functional thin films, improving the consistency of film performance.
Electronic Device Deposition: Used for semiconductor and functional thin film deposition, improving device reliability and thermal stability.
Optical Thin Films and Coatings: Suitable for the fabrication of transparent conductive films, anti-reflective films, and other optical functional layers.
Research and Process Validation: Supports research on new thin film materials and optimization of deposition parameters.
Q1: What thin films are Silicon Monoxide sputtering targets mainly used for?
A1: Primarily used for thin films in electronic devices, optical films, and functional coatings.
Q2: How does the SiO target perform in high-temperature deposition?
A2: High thermal stability ensures uniform film deposition even at high temperatures.
Q3: Which sputtering processes is this target suitable for?
A3: Suitable for magnetron sputtering and other conventional thin film deposition processes.
Q4: Does the target structure affect film uniformity?
A4: A well-designed target structure can improve film thickness and composition uniformity.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We have mature supply and technical experience in ceramic sputtering targets, enabling us to provide stable and traceable Silicon Monoxide sputtering targets, supporting customers in achieving highly consistent and reliable thin film deposition during R&D and application phases.
Molecular Formula: SiO
Molecular Weight: 44.09 g/mol
Appearance: Dark brown dense target
Density: 2.12–2.15 g/cm³ (sintered target)
Melting Point: 1460 °C (decomposes)
Crystal Structure: Amorphous/non-crystalline
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us