Silicon Molybdenum Boron sputtering targets are high-performance ternary alloy targets, possessing excellent hardness, heat resistance, and film uniformity. They are widely used in high-wear-resistant coatings, functional thin films, and electronic device deposition processes.
We can provide process-compatible SiMoB sputtering targets and support technical integration of target structure and deposition parameters.
Stable film composition
High hardness and wear resistance
Good thermal stability
Strong process compatibility
Supports multiple sputtering processes
Wear-resistant and protective coatings: SiMoB targets can be used to prepare high-hardness, protective thin films, improving component lifespan.
Functional thin film preparation: Suitable for electronic device and functional layer deposition, improving film performance consistency.
High-temperature heat-resistant thin films: Films maintain structural stability even under high-temperature conditions.
Research and process validation: Used for research and parameter optimization of new materials and thin film processes.
Q1: What thin film applications is Silicon Molybdenum Boron sputtering target suitable for?
A1: Primarily used for high-abrasion-resistant coatings, functional thin films, and thin film deposition in electronic devices.
Q2: How does this target perform in high-temperature deposition?
A2: Ternary alloy targets maintain structural and compositional stability under high-temperature conditions.
Q3: What sputtering processes is Silicon Molybdenum Boron target suitable for?
A3: Suitable for magnetron sputtering and other conventional thin film deposition processes.
Q4: Does the target composition affect thin film performance?
A4: Proper composition design can improve thin film hardness, adhesion, and deposition uniformity.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We have extensive supply and technical experience in the field of multi-alloy sputtering targets, and can provide stable and traceable SiMoB sputtering targets to help customers achieve high consistency and reliability in thin film deposition during the R&D and mass production stages.
Molecular Formula: SiMoB
Appearance: Silver-gray dense target
Density: 6.5–7.2 g/cm³ (depending on Si:Mo:B ratio)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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