Silicon Iron sputtering targets are silicon-iron alloy targets suitable for preparing functional thin films that combine magnetic properties with structural stability. They are commonly used for the deposition of magnetic thin films, electronic devices, and related functional layers.
We can provide process-compatible Silicon Iron sputtering targets and support technical integration of composition, structure, and deposition conditions.
Stable film composition
Combined magnetic and structural properties
Good thermal stability
Suitable for various sputtering processes
High process consistency
Magnetic Thin Films and Magnetic Functional Layers: Silicon Iron thin films are commonly used in magnetic devices to optimize magnetic properties and structural stability.
Microelectronics and Integrated Devices: Suitable for the deposition of functional or auxiliary structural layers in electronic devices.
Sensing and Functional Thin Films: In sensor and functional thin film applications, Si–Fe thin films provide stable material properties.
Research and Process Development: Used for process research and parameter verification of novel magnetic or functional thin films.
Q1: In which fields are Silicon Iron sputtering targets mainly used?
A1: Primarily used in magnetic thin films, electronic devices, and related functional thin films.
Q2: What are the characteristics of SiFe thin films compared to single-iron thin films?
A2: Introducing silicon improves the structural stability and process adaptability of the thin film.
Q3: Is this target suitable for long-term sputtering?
A3: A well-designed alloy target can support a stable and continuous sputtering process.
Q4: Does the alloy target contribute to thin film consistency?
A4: A stable alloy composition helps improve the consistency of thin film thickness and performance.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We have mature material understanding and supply experience in the field of alloy sputtering targets, providing stable and traceable Silicon Iron sputtering targets to support customers in achieving reliable thin film deposition results during the R&D and application stages.
Molecular formula: SiFe
Appearance: Silver-gray dense target
Density: 6.5–7.0 g/cm³ (depending on Si:Fe ratio)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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